1. Field emission properties of nano-composite carbon nitride films
- Author
-
Ioannis Alexandrou, Christopher J. Kiely, Mark Baxendale, Nalin L. Rupesinghe, and Gehan A. J. Amaratunga
- Subjects
Condensed Matter - Materials Science ,Materials science ,Field (physics) ,General Engineering ,Nanoparticle ,Materials Science (cond-mat.mtrl-sci) ,FOS: Physical sciences ,Isotropic etching ,Field electron emission ,chemistry.chemical_compound ,chemistry ,Transmission electron microscopy ,Electric field ,Composite material ,Thin film ,Carbon nitride - Abstract
A modified cathodic arc technique has been used to deposit carbon nitride thin films directly on n+ Si substrates. Transmission Electron Microscopy showed that clusters of fullerene-like nanoparticles are embedded in the deposited material. Field emission in vacuum from as-grown films starts at an electric field strength of 3.8 V/micron. When the films were etched in an HF:NH4F solution for ten minutes, the threshold field decreased to 2.6 V/micron. The role of the carbon nanoparticles in the field emission process and the influence of the chemical etching treatment are discussed., Comment: 22 pages, 8 figures, submitted to J. Vac. Sc. Techn. B
- Published
- 1999
- Full Text
- View/download PDF