9 results on '"Shamiryan, D."'
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2. Growth and characterization of atomic layer deposited WC[sub 0.7]N[sub 0.3] on polymer films.
3. Low dielectric constant materials for microelectronics.
4. Factors affecting an efficient sealing of porous low-k dielectrics by physical vapor deposition Ta(N) thin films.
5. Effect of energetic ions on plasma damage of porous SiCOH low-k materials.
6. Influence of crystallographic orientation on dry etch properties of TiN.
7. Diffusion barrier integrity evaluation by ellipsometric porosimetry.
8. Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma.
9. Characterization of Cu surface cleaning by hydrogen plasma.
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