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Characterization of Cu surface cleaning by hydrogen plasma.
- Source :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 4, p1201-1211, 11p
- Publication Year :
- 2001
Details
- Language :
- English
- ISSN :
- 10711023
- Volume :
- 19
- Issue :
- 4
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
- Publication Type :
- Academic Journal
- Accession number :
- 74345077
- Full Text :
- https://doi.org/10.1116/1.1387084