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Characterization of Cu surface cleaning by hydrogen plasma.

Authors :
Baklanov, M. R.
Shamiryan, D. G.
Tökei, Zs.
Beyer, G. P.
Conard, T.
Vanhaelemeersch, S.
Maex, K.
Source :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 4, p1201-1211, 11p
Publication Year :
2001

Details

Language :
English
ISSN :
10711023
Volume :
19
Issue :
4
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
Publication Type :
Academic Journal
Accession number :
74345077
Full Text :
https://doi.org/10.1116/1.1387084