1. In situ electric-field control of ferromagnetic resonance in the low-loss organic-based ferrimagnet V[TCNE]x∼2.
- Author
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Kurfman, Seth W., Franson, Andrew, Shah, Piyush, Shi, Yueguang, Cheung, Hil Fung Harry, Nygren, Katherine E., Swyt, Mitchell, Buchanan, Kristen S., Fuchs, Gregory D., Flatté, Michael E., Srinivasan, Gopalan, Page, Michael, and Johnston-Halperin, Ezekiel
- Abstract
We demonstrate indirect electric-field control of ferromagnetic resonance (FMR) in devices that integrate the low-loss, molecule-based, room-temperature ferrimagnet vanadium tetracyanoethylene (V[TCNE]
x∼2 ) mechanically coupled to PMN-PT piezoelectric transducers. Upon straining the V[TCNE]x films, the FMR frequency is tuned by more than 6 times the resonant linewidth with no change in Gilbert damping for samples with α = 6.5 × 10−5 . We show this tuning effect is due to a strain-dependent magnetic anisotropy in the films and find the magnetoelastic coefficient |λs | ∼ (1–4.4) ppm, backed by theoretical predictions from density-functional theory calculations and magnetoelastic theory. Noting the rapidly expanding application space for strain-tuned FMR, we define a new metric for magnetostrictive materials, magnetostrictive agility, given by the ratio of the magnetoelastic coefficient to the FMR linewidth. This agility allows for a direct comparison between magnetostrictive materials in terms of their comparative efficacy for magnetoelectric applications requiring ultra-low loss magnetic resonance modulated by strain. With this metric, we show V[TCNE]x is competitive with other magnetostrictive materials, including YIG and Terfenol-D. This combination of ultra-narrow linewidth and magnetostriction, in a system that can be directly integrated into functional devices without requiring heterogeneous integration in a thin film geometry, promises unprecedented functionality for electric-field tuned microwave devices ranging from low-power, compact filters and circulators to emerging applications in quantum information science and technology. [ABSTRACT FROM AUTHOR]- Published
- 2024
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