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In situ electric-field control of ferromagnetic resonance in the low-loss organic-based ferrimagnet V[TCNE]x∼2.
- Source :
- APL Materials; May2024, Vol. 12 Issue 5, p1-10, 10p
- Publication Year :
- 2024
-
Abstract
- We demonstrate indirect electric-field control of ferromagnetic resonance (FMR) in devices that integrate the low-loss, molecule-based, room-temperature ferrimagnet vanadium tetracyanoethylene (V[TCNE]<subscript>x∼2</subscript>) mechanically coupled to PMN-PT piezoelectric transducers. Upon straining the V[TCNE]<subscript>x</subscript> films, the FMR frequency is tuned by more than 6 times the resonant linewidth with no change in Gilbert damping for samples with α = 6.5 × 10<superscript>−5</superscript>. We show this tuning effect is due to a strain-dependent magnetic anisotropy in the films and find the magnetoelastic coefficient |λ<subscript>s</subscript>| ∼ (1–4.4) ppm, backed by theoretical predictions from density-functional theory calculations and magnetoelastic theory. Noting the rapidly expanding application space for strain-tuned FMR, we define a new metric for magnetostrictive materials, magnetostrictive agility, given by the ratio of the magnetoelastic coefficient to the FMR linewidth. This agility allows for a direct comparison between magnetostrictive materials in terms of their comparative efficacy for magnetoelectric applications requiring ultra-low loss magnetic resonance modulated by strain. With this metric, we show V[TCNE]<subscript>x</subscript> is competitive with other magnetostrictive materials, including YIG and Terfenol-D. This combination of ultra-narrow linewidth and magnetostriction, in a system that can be directly integrated into functional devices without requiring heterogeneous integration in a thin film geometry, promises unprecedented functionality for electric-field tuned microwave devices ranging from low-power, compact filters and circulators to emerging applications in quantum information science and technology. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 2166532X
- Volume :
- 12
- Issue :
- 5
- Database :
- Complementary Index
- Journal :
- APL Materials
- Publication Type :
- Academic Journal
- Accession number :
- 177609986
- Full Text :
- https://doi.org/10.1063/5.0189565