1. Thermally Assisted Nonvolatile Memory in Monolayer MoS2 Transistors.
- Author
-
He, G., Ramamoorthy, H., Kwan, C.-P., Lee, Y.-H., Nathawat, J., Somphonsane, R., Matsunaga, M., Higuchi, A., Yamanaka, T., Aoki, N., Gong, Y., Zhang, X., Vajtai, R., Ajayan, P. M., and Bird, J. P.
- Subjects
- *
NONVOLATILE memory , *MOLYBDENUM disulfide , *TRANSISTORS , *FIELD-effect transistors , *DIELECTRICS - Abstract
We demonstrate a novel form of thermally-assisted hysteresis in the transfer curves of monolayer MoS2 FETs, characterized by the appearance of a large gate-voltage window and distinct current levels that differ by a factor of ∼10². The hysteresis emerges for temperatures in excess of 400 K and, from studies in which the gate-voltage sweep parameters are varied, appears to be related to charge injection into the SiO2 gate dielectric. The thermally-assisted memory is strongly suppressed in equivalent measurements performed on bilayer transistors, suggesting that weak screening in the monolayer system plays a vital role in generating its strongly sensitive response to the charge-injection process. By exploiting the full features of the hysteretic transfer curves, programmable memory operation is demonstrated. The essential principles demonstrated here point the way to a new class of thermally assisted memories based on atomically thin two-dimensional semiconductors. [ABSTRACT FROM AUTHOR]
- Published
- 2016
- Full Text
- View/download PDF