1. Atomic and molecular layer deposition for surface modification.
- Author
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Vähä-Nissi, Mika, Sievänen, Jenni, Salo, Erkki, Heikkilä, Pirjo, Kenttä, Eija, Johansson, Leena-Sisko, Koskinen, Jorma T., and Harlin, Ali
- Subjects
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SURFACES (Physics) , *GAS-solid interfaces , *POROUS materials , *EXTRUSION process , *LACTIC acid - Abstract
Abstract: Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gas–solid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. However, thin – even non-uniform – atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid. [Copyright &y& Elsevier]
- Published
- 2014
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