1. Laminated Ferroelectric FET With Large Memory Window and High Reliability
- Author
-
Lee, Hyun Jae, Nam, Seunggeol, Lee, Yunseong, Kim, Kihong, Choe, Duk-Hyun, Yoo, Sijung, Park, Yoonsang, Jo, Sanghyun, Kim, Donghoon, and Heo, Jinseong
- Abstract
In this work, we report a planar Si-based ferroelectric field-effect transistor (FEFET) characterized by a high memory window (MW) of 4.79 V, ten-year retention, and pass disturb-free characteristics. This achievement is realized through the use of a 20-nm-thick laminated Hf
$_{{0}.{5}}$ ${t}_{\text {FE}}$ ${E}_{C}$ ${N}_{\text {HZO}}$ ${E}_{C}$ ${N}_{\text {HZO}}$ ${P}_{\text {eff}}$ ${P}_{\text {r}}$ ${V}_{\text {T}}$ ${P}_{\text {eff}}$ ${V}_{\text {T}}$ ${P}_{\text {r}}$ ${P}_{\text {eff}}$ ${E}_{C}$ - Published
- 2024
- Full Text
- View/download PDF