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In this paper, a solar-blind ultraviolet photodetector (PD) based on the graphene/vertical Ga2O3 nanowire array heterojunction was proposed and demonstrated. To the best of our knowledge, it is the first time that vertical Ga2O3 nanowire arrays have been realized. Ga2O3 nanowires were obtained by thermally oxidizing GaN nanowires grown by molecular beam epitaxy on n-doped Si substrate. Then, a monolayer graphene film was transferred to Ga2O3 nanowires to form the graphene/vertical Ga2O3 nanowire array heterojunction and transparent electrodes. The fabricated device exhibited a responsivity (R) of 0.185 A/W and rejection ratio (R258 nm/R365 nm) of 3×104 at the bias of −5 V. Moreover, the fast response times of this PD were 9 and 8 ms for the rise and decay times under 254 nm illumination, respectively, which are attributed to the unique properties of nanowire arrays and the graphene/vertical Ga2O3 nanowire array heterojunction structure.

Au nanoparticles (NPs) were designed to be embedded into III-V semiconductors to form Au/GaAs Schottky heterostructures, which were used as top-modified cover layers for quantum dot semiconductor saturable absorption mirrors (QD-SESAMs). By harnessing the distinctive localized surface plasmon resonance (LSPR) effect exhibited by Au NPs, a remarkable enhancement in photogenerated carrier concentration is achieved at the heterojunction interface. Consequently, this leads to a significant improvement in the nonlinear optical characteristics of the device. The modulation depth (MD) and saturation fluence of the device are optimized from the initial 2.2% and 16.1 MW/cm2 to 2.8% and 8.3 MW/cm2, respectively. Based on the optimized device, a Q-switched laser has been developed with an impressive output power of 17.61 mW and a single pulse energy of 274.9 nJ. These results unequivocally showcase the exceptional advantages offered by utilizing Au NPs to optimize the nonlinear optical characteristics of III-V semiconductor devices, thereby highlighting its immense potential for practical applications in various fields. [ABSTRACT FROM AUTHOR]

The inverted metamorphic AlGaInP/AlGaAs/GaAs/InGaAs/InGaAs five‐junction solar cells with the bandgap energies of 2.0/1.67/1.42/1.18/0.83 eV were grown by metal–organic chemical vapor deposition on GaAs substrates. The mismatch stress between the two bottom (In0.17Ga0.83As and In0.46Ga0.54As) cells and GaAs substrate was nearly fully relaxed owing to the growth of AlInGaAs compositionally step‐graded buffers. By employing the low‐temperature epilayer transfer technology with only one‐time temporary bonding, the flexible five‐junction solar cells with the size of 12 cm2 were successfully fabricated. The conversion efficiency was 35.1% with the open‐circuit voltage of 4.73 V under AM1.5G spectrum. The excellent performance of the large‐size five‐junction solar cells is attributed to the low amount of mismatch dislocations in the material as well as the simple fabrication process of the flexible device. [ABSTRACT FROM AUTHOR]

The fast development of brain-inspired neuromorphic computing systems has stimulated urgent requirements for artificial synapses with low-power consumption. In this work, a photonic synaptic device based on (Al,Ga)N nanowire/graphene heterojunction has been proposed and demonstrated successfully. In the artificial synaptic device, the incident light, the nanowire/graphene heterojunction, and the light-generated carriers play the roles of action potential, pre-synaptic/post-synaptic membrane, and neurotransmitter in a biological synapse, respectively. As a key synaptic function, the paired pulse facilitation index of the photonic synapse can reach 202%, which can be modulated by the interval time between two adjacent light pulses. It is found that the graphene defects, the surface band bending, and the Al vacancies on the surface of (Al,Ga)N nanowires can be the key reasons contributing to the synaptic characteristics of artificial photonic devices. Hence, the dynamic "learning–forgetting" performance of the artificial synaptic device can resemble the "learning–forgetting" behavior of the human brain. Furthermore, the hand-written digits are set up to mimic a typical characteristic of human perceptual learning. After only three training epochs, the simulated network can achieve a high recognition rate of over 90% based on the experimental conductance for long-term potentiation and long-term depression. In supervised learning processes, such few training times are beneficial to reduce energy consumption significantly. Therefore, in the area of neuromorphic computing technology and artificial intelligence systems requiring low-power consumption, this work paves a potential way to develop the optoelectronic synapse based on semiconductor nanowires. [ABSTRACT FROM AUTHOR]

InGaN quantum dots (QDs) have attracted significant attention as a promising material for high-efficiency micro-LEDs. In this study, plasma-assisted molecular beam epitaxy (PA-MBE) was used to grow self-assembled InGaN QDs for the fabrication of green micro-LEDs. The InGaN QDs exhibited a high density of over 3.0 × 1010 cm−2, along with good dispersion and uniform size distribution. Micro-LEDs based on QDs with side lengths of the square mesa of 4, 8, 10, and 20 μm were prepared. Attributed to the shielding effect of QDs on the polarized field, luminescence tests indicated that InGaN QDs micro-LEDs exhibited excellent wavelength stability with increasing injection current density. The micro-LEDs with a side length of 8 μm showed a shift of 16.9 nm in the peak of emission wavelength as the injection current increased from 1 A/cm2 to 1000 A/cm2. Furthermore, InGaN QDs micro-LEDs maintained good performance stability with decreasing platform size at low current density. The EQE peak of the 8 μm micro-LEDs is 0.42%, which is 91% of the EQE peak of the 20 µm devices. This phenomenon can be attributed to the confinement effect of QDs on carriers, which is significant for the development of full-color micro-LED displays. [ABSTRACT FROM AUTHOR]

The charge carrier concentration profile is a critical factor that determines semiconducting material properties and device performance. Dielectric force microscopy (DFM) has been previously developed to map charge carrier concentrations with nanometer-scale spatial resolution. However, it is challenging to quantitatively obtain the charge carrier concentration, since the dielectric force is also affected by the mobility. Here, we quantitative measured the charge carrier concentration at the saturation mobility regime via the rectification effect-dependent gating ratio of DFM. By measuring a series of n-type GaAs and GaN thin films with mobility in the saturation regime, we confirmed the decreased DFM-measured gating ratio with increasing electron concentration. Combined with numerical simulation to calibrate the tip–sample geometry-induced systematic error, the quantitative correlation between the DFM-measured gating ratio and the electron concentration has been established, where the extracted electron concentration presents high accuracy in the range of 4 × 1016 – 1 × 1018 cm−3. We expect the quantitative DFM to find broad applications in characterizing the charge carrier transport properties of various semiconducting materials and devices. [ABSTRACT FROM AUTHOR]

Metal modulation epitaxy (MME) is a technique in which metal beams (Al, Ga, In, and Mg) are switched on and off in short periods in an RF MBE system while a continuous nitrogen plasma beam is kept on. We systematically studied the effect of periodic duty cycling on the morphology, crystalline quality, Mg doping concentration, and electrical properties of GaN:Mg films grown by MME. When the metal shutter duty cycling is 20 s open/10 s close, the sample has smooth surface with clear steps even with Mg doping concentration higher than 1 × 1020 cm−3. The RMS roughness is about 0.5 nm. The FWHM of (002) XRD rocking curve is 230 arcsec and the FWHM of (102) XRD rocking curve is 260 arcsec. As result, a hole concentration of 5 × 1018 cm−3 and a resistivity of 1.5 Ω·cm have been obtained. The hole concentration increases due to the incorporation of surface accumulated Mg dopants into suitable Ga substitutional sites with minimal formation of compensatory defects. [ABSTRACT FROM AUTHOR]

Due to the emerging requirements of miniaturization and multifunctionality, monolithic devices with both functions of lighting and detection are essential for next-generation optoelectronic devices. In this work, based on freestanding (In,Ga)N films, we demonstrate a monolithic device with two functions of lighting and self-powered detection successfully. The freestanding (In,Ga)N film is detached from the epitaxial silicon (Si) substrate by a cost-effective and fast method of electrochemical etching. Due to the stress release and the lightening of the quantum-confined Stark effect (QCSE), the wavelength blueshift of electroluminescent (EL) peak is very small (<1 nm) when increasing the injection current, leading to quite stable EL spectra. On the other hand, the proposed monolithic bifunctional device can have a high ultraviolet/visible reject ratio (Q = 821) for self-powered detection, leading to the excellent detection selectivity. The main reason can be attributed to the removal of Si by the lift-off process, which can limit the response to visible light. This work paves an effective way to develop new monolithic multifunctional devices for both detection and display. [ABSTRACT FROM AUTHOR]

Owing to its broadband absorption, ultrafast recovery time, and excellent saturable absorption feature, graphene has been recognized as one of the best candidates as a high-performance saturable absorber (SA). However, the low absorption efficiency and reduced modulation depth severely limit the application of graphene-based SA in ultrafast fiber lasers. In this paper, a single-layer graphene saturable absorber mirror (SG-SAM) was coated by a quarter-wave SiO2 passivated layer, and a significantly enhanced modulation depth and reduced saturation intensity were obtained simultaneously compared to the SG-SAM without the SiO2 coating layer. In addition, long-term operational stability was found in the device due to the excellent isolation and protection of the graphene absorption layer from the external environment by the SiO2 layer. The high performance of the SAM was further confirmed by the construction of a ring-cavity EDF laser generating mode-locked pulses with a central wavelength of 1563.7 nm, a repetition rate of 34.17 MHz, and a pulse width of 830 fs. [ABSTRACT FROM AUTHOR]

Flexible ultraviolet (UV) photodetectors (PDs) can meet the growing demands and wide applications of next‐generation portable and lightweight optoelectronic devices. Herein, a flexible UV PD based on (Al,Ga)N nanowires (NWs) is proposed and successfully fabricated by numerical and experimental approaches, which have high UV/visible reject ratio (1.5 × 104) and detectivity (8 × 1010 Jones). To accelerate the carrier transport and enhance the response, the top–down–top current pathway is demonstrated by introducing interdigitated electrodes and graphene. The UV/visible reject ratio of the flexible PD can be enhanced over 40 times by removing epitaxial silicon substrate to eliminate the corresponding visible response, leading to an excellent detection selectivity. By numerical simulations, the electric field intensities of the NWs are comparative in the unbending and bending states. After −120° bending, the PD performance remains quite stable. Under different bending states, the maximum variation of different response time can be kept within 0.15 s. According to the experimental data, the barrier height is essentially unchanged under different bending states, which should be a key factor contributing to the outstanding stability of the PD. [ABSTRACT FROM AUTHOR]

Ge1−xSnx film with Sn content (at%) as high as 13% was grown on Si (100) substrate with Ge buffer layer by magnetron sputtering epitaxy. According to the analysis of HRXRD and Raman spectrum, the quality of the Ge1−xSnx crystal was strongly dependent on the growth temperature. Among them, the GeSn (400) diffraction peak of the Ge1−xSnx film grown at 240 °C was the lowest, which is consistent with the Raman result. According to the transmission electron microscope image, some dislocations appeared at the interface between the Ge buffer layer and the Si substrate due to the large lattice mismatch, but a highly ordered atomic arrangement was observed at the interface between the Ge buffer layer and the Ge1−xSnx layer. The Ge1−xSnx film prepared by magnetron sputtering is expected to be a cost-effective fabrication method for Si-based infrared devices. [ABSTRACT FROM AUTHOR]

Lightweight and flexible III–V solar cells create new opportunities for application in satellites, drones, and wearable devices. In this article, a module manufacturing scheme based on resistance welding and lamination technology is proposed to meet the demands of practical application. A combined laminate structure of ethylene–tetrafluoroethylene plus ethylene octene copolymer and polyimide is used to encapsulate flexible III–V solar cells. In laboratory measurements with a spectrum close to AM1.5G, the photoelectric conversion efficiency of the flexible solar cell is 34.4% with an open‐circuit voltage of 3.04 V, and the efficiency of the flexible module is 32.7% with a weight density of 469 g m−2. The electroluminescence measurements show good performance of the flexible solar cell module, which is expected to achieve large‐size flexible III–V solar cells encapsulation. [ABSTRACT FROM AUTHOR]