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Abstract We investigate the voltage control of magnetism in a van der Waals (vdW) heterostructure device consisting of two distinct vdW materials, the ferromagnetic Fe3-x GeTe2 and the ferroelectric In2Se3. It is observed that gate voltages applied to the Fe3-x GeTe2/In2Se3 heterostructure device modulate the magnetic properties of Fe3-x GeTe2 with significant decrease in coercive field for both positive and negative voltages. Raman spectroscopy on the heterostructure device shows voltage-dependent increase in the in-plane In2Se3 and Fe3-x GeTe2 lattice constants for both voltage polarities. Thus, the voltage-dependent decrease in the Fe3-x GeTe2 coercive field, regardless of the gate voltage polarity, can be attributed to the presence of in-plane tensile strain. This is supported by density functional theory calculations showing tensile-strain-induced reduction of the magnetocrystalline anisotropy, which in turn decreases the coercive field. Our results demonstrate an effective method to realize low-power voltage-controlled vdW spintronic devices utilizing the magnetoelectric effect in vdW ferromagnetic/ferroelectric heterostructures.

We have investigated the effect of annealing of graphene sheets on the electrical properties of Au/graphene/n-type silicon Schottky diode. Large scale graphene sheets were grown by chemical vapor deposition and then annealed at 300, 400, and 500°C; one sheet was left un-annealed as the control. The diodes were fabricated by transferring the graphene sheets directly onto n-type Si substrates and the current-voltage (I-V) and capacitance-voltage (C-V) characteristics were evaluated. The average values of the Schottky barrier height (SBH) and ideality factor (η) for the as-fabricated Au/graphene/n-type silicon Schottky diode from I-V measurements were determined to be ~0.8±0.01eV and ~1.79±0.05, respectively, whereas the SBH from C-V measurements was ~0.89±0.01eV. The electrical transport characteristics measured at room temperature indicated that annealing of graphene sheet prior to the transfer of the graphene onto the n-Si substrates significantly reduces the electric degradation of the Schottky diodes, even though no distinct differences in other electric properties, including ideality factors and SBHs, before or after annealing of the graphene sheets were observed. Thus, by simply annealing the graphene sheets at 500°C, we found that the Au/graphene/n-type silicon Schottky diode showed an approximately 3.3-fold lower series resistance as compared with the un-annealed Schottky diode under air exposure of up to 7days. These annealed diodes showed significantly reduced electrical degradation by removing the potentially trapped H2O and/or O2 at the interface between the graphene layer and the n-Si substrate. [ABSTRACT FROM AUTHOR]