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Studies the use of high resolution x-ray diffraction thin indium arsenide and gallium arsenide layers grown on InP substrates by low-pressure metalorganic vapor-phase epitaxy. Growth parameter and structural parameter of the investigated samples; Superlattice periods determined from the observed satellites separations; Enlargement of an experimental rocking curve of sample IX in the vicinity of the zeroth-order peak.

Presents a detailed characterization of the ordered structure in silicon-doped Ga[sub0.51]In[sub0.49]P. Influence of silicon doping on the ordering in GaInP layers; Analysis of undoped layers grown at various substrate temperatures; Relationships between photoluminescence peak energy and electron concentration of silicon-doped samples at room temperature.

Presents a study that investigated gallium compound interfaces grown by low-pressure metalorganic vapor phase epitaxy at various temperatures and in different structures. Use of photoluminescence method; Results of the examination on gallium compound using x-ray diffraction measurements and simulations with dynamical theory.