1. Stress analysis of Mo, MoSi 2 and Si mono-layer thin films and multilayers prepared by magnetron sputtering
- Author
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Xiaoqiang Wang, Qiushi Huang, Zhanshan Wang, Haochuan Li, Fengli Wang, Jingtao Zhu, and Lingyan Chen
- Subjects
Stress (mechanics) ,Optics ,Materials science ,Compressive strength ,business.industry ,Extreme ultraviolet ,X-ray ,Radius ,Sputter deposition ,Thin film ,Composite material ,business ,Deposition (law) - Abstract
To improve the stress property of multilayer optics working in extreme ultraviolet and x-ray range, mono-layer thin films of Mo, MoSi2, Si, with thickness of 100nm, and periodic multilayers of [Mo/Si] 20 , [MoSi 2 /Si] 20 , with period thickness of 20nm, were prepared by direct current magnetron sputtering method. Before and after each deposition, the radius of surface curvatures of substrates were measured using a stylus profiler and then the film stress was calculated. The measurement results indicate that, Mo, MoSi 2 and Si mono-layer thin films all shows compressive stress, while Mo/Si multilayer shows tensile stress, i.e., the film stress changes significantly during Mo/Si multilayer growth. For MoSi 2 /Si multilayer, the film stress still keeps compressive, which indicates more stable stress property.
- Published
- 2010