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We present a QVGA (320x240 with 3 sub-pixel) top-emitting AMOLED display with 250ppi resolution using a self-aligned (SA) IGZO TFT backplane on polyimide-foil with full barrier. The back plane process flow is based on a 7 layer photolithography process. The aperture ratio of the top-emitting OLEDs is approx. 80%. An integrated gate driver is shown that can be driven at operation speed equivalent to a 4k2k display at 100Hz

In this work we present the impact of buffer layers deposited by various techniques such as plasma enhanced chemical deposition (PECVD), physical vapor deposition (PVD) and atomic layer deposition (ALD) techniques on self-aligned (SA) top gate amorphous-Indium-Gallium-Zinc-Oxide (a-IGZO) TFT characteristics. Finally an optimized layer was integrated in TFT backplane on polyimide (PI) foil and a QQVGA AMOLED display is demonstrated.

We present a QQVGA (160times120 with 3 sub-pixel) top-emitting AMOLED display with 85ppi resolution using a self-aligned (SA) IGZO TFT backplane on polyimide-foil. The back plane process flow is based on a 5 layer photolithography process. The aperture ratio of the top-emitting OLEDs is approx. 25%. For operation at 6 V supply voltage (VDD), the brightness of the display exceeds 150cd/m2. On the same substrate a 160 stage gate-driver was measured at FHD rate. cop. 2014 Society for Information Display.

In this study, the authors report high-quality amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) thin film transistors (TFTs) fabricated using a new back-channel-etch (BCE) process flow on Polyethylene Naphthalate (PEN) foil. The BCE flow allows a better scalability of TFTs for high-resolution backplanes and related circuits. The maximum processing temperature was limited to less than 165oC in order to ensure good overlay accuracy (< 1µm) on foil. The presented process flow differs from to previously reported by defining the Mo S/D contacts by dry etch prior to a-IGZO patterning. The TFTs show good electrical performance, including field-effect mobilities in the range of 15.0cm2/(V.s), sub-threshold slopes of 0.3V/decade and off-currents

We have developed a full color flexible top-emission AMOLED display with 80 ppi resolution using In-Ga-Zn-O TFT backplane on PEN foil under the maximum process temperature of 150 oC. Notwithstanding the low processing temperature, the TFTs with SiOx passivation layer show high reliability with VTH shift of less than 0.2 V at 10,000 seconds under bias-stress of -10 V. cop. 2013 Society for Information Display.

AMOLED backplanes were fabricated on both rigid glass and flexible plastic substrates using a solution processed oxide semiconductor processed at temperatures

In this work, we present the impact of S/D contact formation, that is, by SiN plasma doping (hydrogen incorporation), metallic reduction (by calcium) and by argon plasma (compositional change) on NBIS instabilities of self-aligned a-IGZO TFTs.

This work describes integrated readout electronics for on-panel fingerprint detection, focusing on two key building blocks: charge sense amplifier (CSA) and analog-to-digital converter (ADC). The CSA has been realized in a dual-gate self-aligned IGZO thin-film transistor (TFT) technology with channel length downsizing to 3µm, enabling 1.3mm bezel size for the peripheral readout electronics and 1fps readout of a 1-Mpixel 500dpi sensor array. The ADC has been realized in two different transistor technologies, IGZO and Indium-Tin-Zinc-Oxide (ITZO). The ITZO ADC achieves a sampling rate of 1kS/s, which is 7.5x faster compared to the IGZO ADC, due to the larger mobility of ITZO.