101 results on '"Tanaka, Satoshi"'
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2. Extremely long life excimer laser chamber technology for multi-patterning lithography
3. Mask 3D effect reduction and defect printability of etched multilayer EUV mask
4. Precise measurement technique of long period fiber grating sensors using Fourier transform method
5. High-sensitivity vibration sensing using in-fiber Fabry-Perot interferometer with fiber-Bragg-grating reflectors.
6. Optical performance of laser light source for ArF immersion double patterning lithography tool.
7. New process proximity correction using neural network in spacer patterning technology.
8. Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography.
9. Optimal setting strategy for kernel-based OPC simulation engines.
10. A novel fast 3D resist simulation method using Chebyshev expansion.
11. Lithography compliance check considering neighboring cell structures for robust cell design.
12. Robust PPC and DFM methodology for exposure tool variations.
13. High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography.
14. Prediction of imaging performance of immersion lithography using high refractive index fluid.
15. Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography.
16. Vibration sensing of solid using long-period fiber grating.
17. Scanner fleet management utilizing programmed hotspot patterns.
18. Hotspot management in which mask fabrication errors are considered.
19. Tool-induced hotspot fixing flow for high volume products.
20. Dependence of mask topography effects on pattern variation under hyper-NA lithography.
21. Ion implantation as insoluble treatment for resist stacking process.
22. Impact of patterning strategy on mask fabrication beyond 32nm.
23. A novel lithography design and verification methodology with patterning failure.
24. Ultra-low k1 oxide contact hole formation and metal filling using resist contact hole pattern by double L&S formation method.
25. Mask topography effects of hole patterns on hyper-NA lithography.
26. Evaluation of lithography simulation model accuracy for hotspot-based mask quality assurance.
27. Statistical approach utilizing neural networks for CD error prediction.
28. Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool.
29. Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography.
30. GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography.
31. Hot spot management in ultra-low k1 lithography.
32. Automated hot-spot fixing system applied for metal layers of 65 nm logic devices.
33. Fine pixel SEM image for mask pattern quality assurance based on lithography simulation.
34. Mask pattern quality assurance based on lithography simulation with fine pixel SEM image.
35. Sampling plan optimization for CD control in low k1 lithography.
36. Impact of polarization for an attenuated phase-shift mask with ArF hyper-NA lithography.
37. Evaluation of extendibility for Fourier diffraction theory for topographical mask structure under hyper NA lithography.
38. Lithography simulation system for total CD control from design to manufacturing.
39. Simultaneous measurement of vibration and temperature with fiber Bragg grating.
40. Reticle SEM specifications required for lithography simulation.
41. Temperature-stabilized fiber Bragg grating underwater acoustic sensor array using incoherent light.
42. High-sensitive fiber Bragg grating vibration sensor using intensity-modulated laser source.
43. Alignment mark signal simulation system for the optimum mark feature selection.
44. Contact hole formation by multiple exposure technique in ultralow-k1 lithography.
45. Yield-enhanced layout generation by new design for manufacturability (DfM) flow.
46. A photomask defect evaluation system.
47. PanoramaSeek: intelligent streaming for Internet video retrieval.
48. Numerical analysis of lasing output in organic thin film laser with photo-induced periodic gain structure.
49. Direct distribution of lasing power into multioptical fibers: theoretical estimates.
50. Impact of OPC aggressiveness on mask maufacturability.
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