Back to Search
Start Over
Fine pixel SEM image for mask pattern quality assurance based on lithography simulation.
- Source :
- Proceedings of SPIE; Nov2006 Part 2, Issue 1, p62832E-62832E-8, 8p
- Publication Year :
- 2006
Details
- Language :
- English
- ISSN :
- 0277786X
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 65728955
- Full Text :
- https://doi.org/10.1117/12.681788