19 results on '"Schleunitz, A."'
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2. Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns
3. Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication
4. Advancing high resolution photolithography with hybrid polymers for wafer-scale manufacture of micro-optics and patterned passivation layers
5. Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist
6. Novel approach of patterning technologies enabling monolithic micro-optical components
7. Novel multi-layer nanoimprint lithography material system enabling nano-patterning of functional optical layers
8. Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography.
9. Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication.
10. Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist.
11. Advancing high resolution photolithography with hybrid polymers for wafer-scale manufacture of micro-optics and patterned passivation layers.
12. Novel approach of patterning technologies enabling monolithic micro-optical components.
13. UV-Curable Hybrid Polymers for Optical Applications -- Technical Challenges, Industrial Solutions and Future Developments.
14. Toward a biophotonic MEMS cell sensor.
15. Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework
16. Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists
17. Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography
18. Evaluation of hybrid polymers for high-precision manufacturing of 3D optical interconnects by two-photon absorption lithography
19. UV-curable hybrid polymers for optical applications: technical challenges, industrial solutions, and future developments
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