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Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist.
- Source :
- Proceedings of SPIE; 4/10/2023, Vol. 12497, p124970P-124970P-14, 1p
- Publication Year :
- 2023
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12497
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 163951583
- Full Text :
- https://doi.org/10.1117/12.2661526