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We have investigated selective photoluminescence dye patterning using light stamping lithography (LSL) technique. Polydimethylsiloxane (PDMS) stamp was used for the substrate mold in LSL. In order to determine the formation of patterned PDMS molds, photoluminescence dye was prepared with diaminomaleonitrile moiety and selectively deposited on the patterned PDMS molds. UV-vis absorption and photoluminescence (PL) spectra of the dye were determined at 535 nm and 580 nm, respectively. The corresponding selective dye layer deposition was formed by hydrophobic interactions between PDMS and dye molecules. [ABSTRACT FROM AUTHOR]

By self-assembly layer-by-layer technique, ordered multi-layer films being composed of diazonium resin, J-acid, photochromic spiroxazine and poly(sodium-4-styrene)sulfonate (PSS) were alternately fabricated on the glass slide, The fabrication of the multi-layer films was characterized by UV-vis spectroscopy and Atomic Force Microscopy (AFM). During the first bilayer fabrication, azo dye was simultaneously synthesized by diazo coupling reaction between diazonium resin and J-acid coupler. It is displayed from the multi-layer films that spectral chromism effect by spiroxazine moiety was determined. AFM results also show that the multi-dye layer fabrication was successfully obtained by stepwise chemical assembly and that the surface of the multi-layer was relatively uniform. [ABSTRACT FROM AUTHOR]

We reported a simple method to pattern quantum dots, CdSe/ZnS, on selectively functionalized surface. This selective patterning of the quantum dots solution can be understood by considering the difference in affinity owing to different chemical functionality between the surface charge of quantum dots and transferred polyelectrolyte. Thus the quantum dots can be easily deposited on desired surface by simple dipping method. And the patterned shape and size can be freely controlled by polymer transfer technique according to the variation of used micromold. [ABSTRACT FROM AUTHOR]