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Selective Photoluminescence Dye Patterning on Light Stamping Lithography (LSL) PDMS molds.
- Source :
-
Molecular Crystals & Liquid Crystals . 2008, Vol. 491 Issue 1, p88-93. 6p. 1 Black and White Photograph, 2 Diagrams, 1 Graph. - Publication Year :
- 2008
-
Abstract
- We have investigated selective photoluminescence dye patterning using light stamping lithography (LSL) technique. Polydimethylsiloxane (PDMS) stamp was used for the substrate mold in LSL. In order to determine the formation of patterned PDMS molds, photoluminescence dye was prepared with diaminomaleonitrile moiety and selectively deposited on the patterned PDMS molds. UV-vis absorption and photoluminescence (PL) spectra of the dye were determined at 535 nm and 580 nm, respectively. The corresponding selective dye layer deposition was formed by hydrophobic interactions between PDMS and dye molecules. [ABSTRACT FROM AUTHOR]
- Subjects :
- *PHOTOLUMINESCENCE
*LITHOGRAPHY
*SILOXANES
*DYES & dyeing
*MOLECULES
Subjects
Details
- Language :
- English
- ISSN :
- 15421406
- Volume :
- 491
- Issue :
- 1
- Database :
- Academic Search Index
- Journal :
- Molecular Crystals & Liquid Crystals
- Publication Type :
- Academic Journal
- Accession number :
- 34870487
- Full Text :
- https://doi.org/10.1080/15421400802329384