1. Electron emission properties of graphene-oxide-semiconductor planar-type electron emission devices
- Author
-
Yoichi Yamada, Yoshihiro Nemoto, Katsuhisa Murakami, Masahiro Sasaki, Shunsuke Tanaka, Takuya Iijima, Masayoshi Nagao, and Masaki Takeguchi
- Subjects
Materials science ,Annealing (metallurgy) ,Astrophysics::High Energy Astrophysical Phenomena ,Field emitter array ,Astrophysics::Cosmology and Extragalactic Astrophysics ,02 engineering and technology ,Electron ,01 natural sciences ,law.invention ,Planar ,Oxide semiconductor ,law ,0103 physical sciences ,Microscopy ,Materials Chemistry ,Work function ,Electrical and Electronic Engineering ,Instrumentation ,Astrophysics::Galaxy Astrophysics ,010302 applied physics ,Graphene ,business.industry ,Process Chemistry and Technology ,021001 nanoscience & nanotechnology ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Optoelectronics ,0210 nano-technology ,business - Abstract
The electron emission properties of planar-type electron emission devices based on a graphene-oxide-semiconductor (GOS) structure before and after vacuum annealing were investigated. The fluctuation of the electron emission current was around 0.07%, which is excellent stability compared to the conventional field emitter array. The GOS devices were operable in very low vacuum of 10 Pa without any deterioration of their electron emission properties. Improvement of the electron emission properties of the GOS devices was achieved by vacuum annealing at 300 °C. The electron emission efficiency of the GOS type electron emission devices reached 2.7% from 0.2% after vacuum annealing. The work function of the graphene electrode was found to decrease 0.26 eV after vacuum annealing by Kelvin force probe microscopy analysis. These results indicated that the improvement of the electron emission efficiency of the GOS devices by vacuum annealing is due to the decrease in the work function of the graphene electrode.
- Published
- 2018