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In clean tunneling junctions (TJs), the momentum parallel to the barrier is conserved in the tunneling process. We predict that this phenomenon can be observed in a TJ between a ferromagnet (FM) and a topological insulator (TI). The FM possesses spin-polarized electron states, while the TI has spin-momentum locked electron states. The tunneling probability is determined by the spin-matrix element between these electron states and leads to the injection of electrons into the TI with finite momentum parallel to the topological surface state. Due to the spin polarization of the electrons in the FM, the resulting current in the TI is not isotropic. The magnitude of the current is calculated quantitatively in terms of the ferromagnetic polarization and should be experimentally detectable using only an electrical setup. [ABSTRACT FROM AUTHOR]

X-ray photoelectron spectroscopy (XPS) was utilized to measure the valence band offset (ΔEV) of the TiZnSnO (TZTO)/Si heterojunction. TZTO films were deposited on Si (100) substrates using magnetron sputtering at room temperature. By using the Zn 2p3/2 and Sn 3d5/2 energy levels as references, the value of ΔEV was calculated to be 2.69 ± 0.1 eV. Combining with the experimental optical energy band gap of 3.98 eV for TZTO extracted from the UV-vis transmittance spectrum, the conduction band offset (ΔEC) was deduced to be 0.17 ± 0.1 eV at the interface. Hence, the energy band alignment of the heterojunction was determined accurately, showing a type-I form. This will be beneficial for the design and application of TZTO/Si hybrid devices. [ABSTRACT FROM AUTHOR]

We have investigated the influence of ZnO orientation on the valence band offset (ΔEV) of Mg0.2Ni0.8O(111)/ZnO (1120) and Mg0.2Ni0.8O(111)/ZnO(0002) heterostructures by x-ray photoelectron spectroscopy. Combining with the experimental optical energy band gap extracted from UV-vis transmittance spectra, the energy band alignment at the interfaces has been determined. The ΔEV has been found to be 1.8 ± 0.1 eV and 1.4 ± 0.1 eV for Mg0.2Ni0.8O(111)/ZnO (1120) and Mg0.2Ni0.8O(111)/ZnO(0002), respectively. Both the heterostructures show type-II band configurations with conduction band offsets (ΔEC) of 2.4 ± 0.1 eV and 2.0 ± 0.1 eV, respectively. The ZnO orientation correlated electronic structure in p-Mg0.2Ni0.8O/n-ZnO interfaces can be explained well by the effect of spontaneous polarization in ZnO. Furthermore, the results offer opportunity that desired band offsets in MgxNi1-xO/ZnO heterostructures can be obtained by appropriately adjusting Mg composition. [ABSTRACT FROM AUTHOR]

The microstructure and crystal orientations of polycrystalline films crucially affect the properties and performance of the films. Controlling preferred orientations (PO) and related film morphology are necessary to obtain the desirable properties. In this paper, we demonstrate a rational and effective route toward the realization of non-polar p-type ZnO thin film with surface texture on quartz substrate through Mn-Na codoping. It is uncovered experimentally and theoretically that mono-doping of Mn creates opportunity to realize PO from polar (c-axis) to non-polar ([formula], [formula], and [formula]) changing. With Mn-Na codoping, an acute modulation of the growth behavior and electrical conductivity of the film have been revealed, leading to weak p-type non-polar Zn0.94Mn0.05Na0.01O (ZMNO) texture. The dominant mechanism for the non-polar self-texture in the current paper is deliberately elucidated as resulting from the interplane surface diffusion with the cooperative effect of impurity dopants. The ZMNO films exhibit p-type conduction with hole concentration of 9.51 × 1015-1.86 × 1017 cm-3 and enhanced room temperature (RT) ferromagnetism possessing a saturation magnetization (Ms) of 1.52 μB/Mn. The results have potential applications in development of non-polar optoelectronic devices such as lighting emitting diodes (LEDs). [ABSTRACT FROM AUTHOR]

The interaction of Na impurities and O vacancies (VO) in ZnO was studied in theory and experiment. The VO facilitated substitutional Na (NaZn/NaZn-) acceptors with inhibiting interstitial Na (Nai/Nai+) donors, which may benefit the p-type conductivity. The formed (NaZn-VO)+/0 complexes induced the change of band structures of ZnO, with the broadening of gap energies and disappearance of the VO2+-related impurity level, which confirmed by the blue shift of the near-band-edge (NBE) UV emission and the decay of the visible emission in PL spectra. The strong and dominant NBE UV emission suggested acceptable luminescence behaviors of Na-doped ZnO. [ABSTRACT FROM AUTHOR]

We propose a specifically designed structure to fabricate thin-film transistors using amorphous indium-gallium-zinc-oxide (a-IGZO) films as the active channel layers. The I-shaped gate electrode is employed to define the channel width, reducing overlaps between the gate and source/drain electrodes. The devices with such a structure exhibit acceptable electrical performance and stability after annealing treatment. The XPS data show that the as-deposited a-IGZO film has not a very dense structure that may induce shallow traps. A shallow trap model is proposed to explain the large threshold voltage shifts of the as-deposited device. Annealing treatment can eliminate these shallow traps and improve the device stability. [ABSTRACT FROM AUTHOR]

Dislocations in the ZnMgO pleated nanosheets were observed from high-resolution transmission electron microscopy (TEM). The Burgers vector was identified as [formula] from the Fourier filtered TEM images. Raman spectra revealed that there were microstructure defects in the ZnMgO nanosheets with the increasing Mg content. The incorporation of the Mg impurities in the ZnMgO nanosheets may promote the congregation of oxygen vacancies and thus facilitate the generation of dislocations. The oxygen deficiency as well as surface dislocations played an important role in determining the optical properties of ZnMgO pleated nanosheets. [ABSTRACT FROM AUTHOR]

Al-doped ZnO (AZO) thin films have been prepared by mist chemical vapor deposition and magnetron sputtering. The band gap shift as a function of carrier concentration in n-type zinc oxide (ZnO) was systematically studied considering the available theoretical models. The shift in energy gap, evaluated from optical absorption spectra, did not depend on sample preparations; it was mainly related to the carrier concentrations and so intrinsic to AZO. The optical gap increased with the electron concentration approximately as ne2/3 for ne≤4.2×1019 cm-3, which could be fully interpreted by a modified Burstein–Moss (BM) shift with the nonparabolicity of the conduction band. A sudden decrease in energy gap occurred at 5.4-8.4×1019 cm-3, consistent with the Mott criterion for a semiconductor-metal transition. Above the critical values, the band gap increased again at a different rate, which was presumably due to the competing BM band-filling and band gap renormalization effects, the former inducing a band gap widening and the latter an offsetting narrowing. The band gap narrowing (ΔEBGN) derived from the band gap renormalization effect did not show a good ne1/3 dependence predicated by a weakly interacting electron-gas model, but it was in excellent agreement with a perturbation theory considering different many-body effects. Based on this theory a simple expression, ΔEBGN=Ane1/3+Bne1/4+Cne1/2, was deduced for n-type ZnO, as well as p-type ZnO, with detailed values of A, B, and C coefficients. An empirical relation once proposed for heavily doped Si could also be used to describe well this gap narrowing in AZO. [ABSTRACT FROM AUTHOR]

(Zn,Al)O thin films have been prepared by a dc reactive magnetron sputtering system with the Al contents in a wide range of 0–50 at. %. The structural, optical, and electrical properties of (Zn,Al)O films were detailedly and systematically studied. The amount of Al in the film was nearly the same as, but often lower than, that in the sputtering target. The growth rate of films monotonically decreased as the Al content increased. In a low Al content region (<10 at. %), Al-doped ZnO (AZO) thin films could be obtained at 400 °C in an Ar–O2 ambient with good properties. The optimal results of n-type AZO films were obtained at an Al content of 4 at. %, with low resistivity ∼10-4 Ω cm, high transmittance ∼90% in the visible region, and acceptable crystal quality with a high c-axis orientation. The band gap could be widened to 3.52 eV at 4 at. % Al due to the Burstein-Moss shift [E. Burstein, Phys. Rev. 93, 632 (1954)] modulated by many-body effects. An appropriate Al-doping concentration served effectively to release the residual, compressive stress in film, which may be the reason for the improvement in film stability and the increment in grain size as well. In a medium Al content region (10–30 at. %), however, the film quality was degraded, which was presumably due to the formation of clusters or precipitates in the grains and boundaries. Besides the (002) plane, other diffraction peaks such as (100) and (101) planes of ZnO were observed, but the (Zn,Al)O films still exhibited a single-phase wurtzite ZnO structure. An intragrain cluster scattering mechanism was proposed to interpret the reduction of carrier mobility in films with the Al contents in the 7–20 at. % region. The solubility limit of Al in ZnO film was identified to be in the 20–30 at. % range, much higher than the thermodynamic solubility limit of 2–3 at. % in ZnO. In a high Al content region (>=30 at. %), there were distinct observations for (Zn,Al)O films. As the Al content was 30 at. %, the film appeared in a two-phase nature with ZnO hexagonal and Al2O3 rhombohedral structures. At the 50 at. % Al content, the matrix of the (Zn,Al)O film was Al2O3, and no evident trace of wurtzite ZnO was observed. The electrical and optical properties for both cases were also very different from those at the Al contents below 30 at. %. [ABSTRACT FROM AUTHOR]