1. ChemInform Abstract: Texture in Thin Film Silicides and Germanides: A Review
- Author
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Christophe Detavernier, Christian Lavoie, K. De Keyser, and B. De Schutter
- Subjects
Silicon ,business.industry ,chemistry.chemical_element ,Germanium ,General Medicine ,Germanide ,chemistry.chemical_compound ,Strain engineering ,chemistry ,Silicide ,Optoelectronics ,Microelectronics ,Texture (crystalline) ,Thin film ,business - Abstract
Silicides and germanides are compounds consisting of a metal and silicon or germanium. In the microelectronics industry, silicides are the material of choice for contacting silicon based devices (over the years, CoSi2, C54-TiSi2, and NiSi have been adopted), while germanides are considered as a top candidate for contacting future germanium based electronics. Since also strain engineering through the use of Si1−xGex in the source/drain/gate regions of MOSFET devices is an important technique for improving device characteristics in modern Si-based microelectronics industry, a profound understanding of the formation of silicide/germanide contacts to silicon and germanium is of utmost importance. The crystallographic texture of these films, which is defined as the statistical distribution of the orientation of the grains in the film, has been the subject of scientific studies since the 1970s. Different types of texture like epitaxy, axiotaxy, fiber, or combinations thereof have been observed in such films. In...
- Published
- 2016
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