1. Vacancy defects in O-doped GaN grown by molecular-beam epitaxy: The role of growth polarity and stoichiometry
- Author
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A. Laakso, M. Rummukainen, J. Oila, Thomas H. Myers, Kimmo Saarinen, and A. J. Ptak
- Subjects
Crystallography ,Materials science ,Physics and Astronomy (miscellaneous) ,Chemical physics ,Vacancy defect ,Doping ,Wide-bandgap semiconductor ,Reactivity (chemistry) ,Epitaxy ,Stoichiometry ,Positron annihilation spectroscopy ,Molecular beam epitaxy - Abstract
Positron annihilation spectroscopy is used to study vacancy defects in GaN grown by molecular-beam epitaxy due to different polar directions and varying stoichiometry conditions during oxygen doping. We show that Ga-polar material is free of compensating Ga vacancies up to [O]=1018 cm−3 in Ga stable growth, but high concentrations of VGa are formed in N-stable conditions. We also show that vacancy clusters are formed in N-polar material grown in Ga stable conditions, which may be related to the higher reactivity of the N-polar surface. These clusters have no apparent influence on the electrical properties of the material. We thus infer that their charge state is neutral.
- Published
- 2004