1. Novel Approach to Conformal FINFET Extension Doping.
- Author
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Zschätzsch, G., Hoffmann, T. Y., Horiguchi, N., Hautala, J., Shao, Y., and Vandervorst, W.
- Subjects
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SEMICONDUCTOR doping , *ION implantation , *ION bombardment , *EXTRACTION techniques , *FIELD-effect transistors , *METAL oxide semiconductor field-effect transistors , *ELECTRODES - Abstract
This paper presents a novel strategy to achieve conformal FINFET extension doping with low tilt-angle beam-line ion implantation. The process relies on the self-aligned cap layer formation exclusively on top of the FIN to tune doping levels in this particular area by partial dopant trapping. The conformality itself is evaluated for n- and p-type dopants by a novel extraction method applied to FIN resistor test structures. Furthermore, the process was integrated into a full NMOS device flow and compared to a highly tilted and more conformal As implant condition. [ABSTRACT FROM AUTHOR]
- Published
- 2011
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