1. Conformal 3D Nanopatterning by Block Copolymer Lithography with Vapor-Phase Deposited Neutral Adlayer
- Author
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Junhwan Choi, Hyeong Min Jin, Sung Gap Im, Seung Keun Cha, Jang Hwan Kim, Gil Yong Lee, Juyeon Kang, Hee Jae Choi, Kyu Hyo Han, Ho Seong Hwang, Sang Ouk Kim, Geon Gug Yang, and Taeyeong Yun
- Subjects
Materials science ,business.industry ,Transistor ,General Engineering ,General Physics and Astronomy ,02 engineering and technology ,Dielectric ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,0104 chemical sciences ,law.invention ,Reduction (complexity) ,law ,Copolymer ,Optoelectronics ,General Materials Science ,Self-assembly ,Thin film ,0210 nano-technology ,business ,Lithography ,Nanoscopic scale - Abstract
Block copolymer (BCP) lithography is an effective nanopatterning methodology exploiting nanoscale self-assembled periodic patterns in BCP thin films. This approach has a critical limitation for nonplanar substrate geometry arising from the reflow and modification of BCP films upon the thermal or solvent annealing process, which is inevitable to induce the mobility of BCP chains for the self-assembly process. Herein, reflow-free, 3D BCP nanopatterning is demonstrated by introducing a conformally grown adlayer by the initiated chemical vapor deposition (iCVD) process. A highly cross-linked poly(divinylbenzene) layer was deposited directly onto the BCP thin film surface by iCVD, which effectively prevented the reflow of BCP thin film during an annealing process. BCP nanopatterns could be stabilized on various substrate geometry, including a nonplanar deformed polymer substrate, a pyramid shape substrate, and a graphene fiber surface. A fiber-type hydrogen evolution reaction (HER) catalyst is suggested by stabilizing lamellar Pt nanopatterns on severely rough graphene fiber surfaces.
- Published
- 2019