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Redox flow batteries (RFBs) are promising energy storage candidates for grid deployment of intermittent renewable energy sources such as wind power and solar energy. Various new redox-active materials have been introduced to develop cost-effective and high-power-density next-generation RFBs. Electrochemical kinetics play critical roles in influencing RFB performance, notably the overpotential and cell power density. Thus, determining the kinetic parameters for the employed redox-active species is essential. In this Perspective, we provide the background, guidelines, and limitations for a proposed electrochemical protocol to define the kinetics of redox-active species in RFBs.

Interfaces comprising incommensurate or twisted hexagonal lattices are ubiquitous and of great interest, from adsorbed organic/inorganic interfaces in electronic devices, to superlubricants, and more recently to van der Waals bilayer heterostructures (vdWHs) of graphene and other 2D materials that demonstrate a range of properties such as superconductivity and ferromagnetism. Here we show how growth of 2D crystalline domains of soft block copolymers (BCPs) on patterned hard hexagonal lattices provide fundamental insights into van der Waals heteroepitaxy. At moderate registration forces, it is experimentally found that these BCP-hard lattice vdWHs do not adopt a simple moire superstructure, but instead adopt local structural relaxations known as mass density waves (MDWs). Simulations reveal that MDWs are a primary mechanism of energy minimization and are the origin of the observed preferential twist angle between the lattices.

Most discoveries in materials science have been made empirically, typically through one-variable-at-a-time (Edisonian) experimentation. The characteristics of materials-based systems are, however, neither simple nor uncorrelated. In a device such as an organic photovoltaic, for example, the level of complexity is high due to the sheer number of components and processing conditions, and thus, changing one variable can have multiple unforeseen effects due to their interconnectivity. Design of Experiments (DoE) is ideally suited for such multivariable analyses: by planning one’s experiments as per the principles of DoE, one can test and optimize several variables simultaneously, thus accelerating the process of discovery and optimization while saving time and precious laboratory resources. When combined with machine learning, the consideration of one’s data in this manner provides a different perspective for optimization and discovery, akin to climbing out of a narrow valley of serial (one-variable-at-a-time) experimentation, to a mountain ridge with a 360° view in all directions.

Research into organic photovoltaics (OPVs) is rapidly growing worldwide because it offers a route to low temperature, inexpensive processing of lightweight, flexible solar cells that can be mass manufactured cheaply. Unlike silicon or other inorganic semiconductors (e.g., CdTe, CIGs), OPVs are complicated by the requirement of having multiple materials and layers that must be integrated to enable the cell to function. The enormous number of research hours required to optimize all aspects of OPVs and to integrate them successfully is typically boiled down to one number-the power conversion efficiency (PCE) of the device. The PCE is the value by which comparisons are routinely made when modifications are made to devices; new bulk heterojunction materials, electron- and hole-transport layers, electrodes, plasmonic additives, and many other new advances are incorporated into OPV devices and compared with one, or a series of, control device(s). The concern relates to the statistical significance of this all-important efficiency/PCE value: is the observed change or improvement in performance truly greater than experimental error? If it is not, then the field can and will be misled by improper reporting of efficiencies, and future research in OPVs could be frustrated and, ultimately, irreversibly damaged. In this Perspective, the dangers of, for instance, cherry-picking of data and poor descriptions of experimental procedures, are outlined, followed by a discussion of a real data set of OPV devices, and how a simple and easy statistical treatment can help to distinguish between results that are indistinguishable experimentally, and those that do appear to be different. © 2013 American Chemical Society.

Silicon surfaces with nanoscale etched patterns were obtained using polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) block copolymer films as templates, followed by brief immersion in HF(aq). The resulting interfaces were comprised of pseudohexagonal arrays of pits on the silicon, whose shapes depended upon the chosen silicon orientation. The top unetched face of silicon remains capped by the native oxide, and the pit interiors are terminated by Si-H x. Selective chemical functionalization via these two chemical handles was demonstrated to be a viable approach toward building nanostructured metal oxide and metal features within these silicon pits and on the top face. Using a series of interfacial chemical reactions, including oxidation (of Si-H x-terminated regions), hydrosilylation, and alkoxysilane-based chemistry on silicon oxide, the growth of metal-based structures can be spatially controlled. In the first approach, titania nanobowls were grown within the etch pits, and in the second, galvanic displacement was used to produce gold nanoparticles either within the etch pits, on the top silicon face, or both. © 2011 American Chemical Society.

Block copolymer thin films can be used as soft templates for a wide range of surfaces where large area patterns of nanoscale features are desired. The cylindrical domains of acid-sensitive, self-assembled monolayers of polystyrene-poly(2-vinylpyridine) block copolymers on silicon surfaces were utilized as structural elements for the production of parallel metal nanowires. Metal ion loading of the P2VP block with simple aqueous solutions of anionic metal complexes is accomplished via protonation of this basic block, rendering it cationic; electrostatic attraction leads to a high local concentration of metal complexes within the protonated P2VP domain. A subsequent brief plasma treatment simultaneously removes the polymer and produces metallic nanowires. The morphology of the patterns can modulated by controlling solution concentration, deposition time, and molecular weight of the block copolymers, as well as other factors. Horizontal metallic nanoarrays can be aligned on e-beam lithographically defined silicon substrates within different shapes, via graphoepitaxy. This method is highly versatile as the procedures to manipulate nanowire composition, dimension, spacing, and orientation are straightforward and based upon efficient aqueous inorganic chemistry.

The self-assembly of block copolymer (BCP) thin films is a versatile method for producing periodic nanoscale patterns with a variety of shapes. The key to attaining a desired pattern or structure is the annealing step undertaken to facilitate the reorganization of nanoscale phase-segregated domains of the BCP on a surface. Annealing BCPs on silicon substrates using a microwave oven has been shown to be very fast (seconds to minutes), both with and without contributions from solvent vapor. The mechanism of the microwave annealing process remains, however, unclear. This work endeavors to uncover the key steps that take place during microwave annealing, which enable the self-assembly process to proceed. Through the use of in situ temperature monitoring with a fiber optic temperature probe in direct contact with the sample, we have demonstrated that the silicon substrate on which the BCP film is cast is the dominant source of heating if the doping of the silicon wafer is sufficiently low. Surface temperatures as high as 240°C are reached in under 1 min for lightly doped, high resistivity silicon wafers (n- or p-type). The influence of doping, sample size, and BCP composition was analyzed to rule out other possible mechanisms. In situ temperature monitoring of various polymer samples (PS, P2VP, PMMA, and the BCPs used here) showed that the polymers do not heat to any significant extent on their own with microwave irradiation of this frequency (2.45 GHz) and power (∼600 W). It was demonstrated that BCP annealing can be effectively carried out in 60 s on non-microwave-responsive substrates, such as highly doped silicon, indium tin oxide (ITO)-coated glass, glass, and Kapton, by placing a piece of high resistivity silicon wafer in contact with the sample-in this configuration, the silicon wafer is termed the heating element. Annealing and self-assembly of polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) and polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCPs into horizontal cylinder structures were shown to take place in under 1 min, using a silicon wafer heating element, in a household microwave oven. Defect densities were calculated and were shown to decrease with higher maximum obtained temperatures. Conflicting results in the literature regarding BCP annealing with microwave are explained in light of the results obtained in this study. © Published 2014 by the American Chemical Society.

Block copolymer (BCP) self-assembly is an effective and versatile approach for the production of complex nanopatterned interfaces. Monolayers of BCP films can be harnessed to produce a variety of different patterns, including lines, with specific spacings and order. In this work, bilayers of cylinder-forming polystyrene-block-polydimethylsiloxane block copolymer (PS-b-PDMS) were transformed into arrays of silica lines with half the pitch normally attained for conventional monolayers, with the PDMS acting as the source for the SiO x. The primary hurdle was ensuring the bilayer silica lines were distinctly separate; to attain the control necessary to prevent overlap, a number of variables related to the materials and self-assembly process were investigated in detail. Developing a detailed understanding of BCP film swelling during solvent annealing, blending of the PS-b-PDMS with PS homopolymer, utilization of a surface brush layer, and adjustment of the plasma exposure conditions, distinct and separate silica lines were prepared. On the microscale, the sample coverage of PS-b-PDMS bilayers was investigated and maximized to attain >95% bilayers under defined conditions. The bilayer BCP structures were also amenable to graphoepitaxy, and thus, dense and highly ordered arrays of silica line patterns with tightly controlled width and pitch were fabricated and distributed uniformly across a Si surface. © 2013 American Chemical Society.

Block copolymer self-assembly is an innovative technology capable of patterning technologically relevant substrates with nanoscale precision for a range of applications from integrated circuit fabrication to tissue interfacing, for example. In this article, we demonstrate a microwave-based method of rapidly inducing order in block copolymer structures. The technique involves the usage of a commercial microwave reactor to anneal block copolymer films in the presence of appropriate solvents, and we explore the effect of various parameters over the polymer assembly speed and defect density. The approach is applied to the commonly used poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) and poly(styrene)-b-poly(2-vinylpyridine) (PS-b-P2VP) families of block copolymers, and it is found that the substrate resistivity, solvent environment, and anneal temperature all critically influence the self-assembly process. For selected systems, highly ordered patterns were achieved in less than 3 min. In addition, we establish the compatibility of the technique with directed assembly by graphoepitaxy.