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5 results on '"Manchanda, L."'

1. Multi-component high-K gate dielectrics for the silicon industry

Author: Manchanda, L., Morris, M. D., Green, M. L., Dover, R. B. van, Klemens, F., Sorsch, T. W., Silverman, P. J., Wilk, G., Busch, B., and Aravamudhan, S.
Published: 2001
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2. The nature of intrinsic hole traps in thermal silicon dioxide

Author: Manchanda, L., Vasi, J., and Bhattacharyya, A. B.
Published: 1981
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3. Hole traps in thermal silicon dioxide introduced by chlorine

Author: Manchanda, L., Vasi, J., and Bhattacharyya, A. B.
Published: 1980
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4. Gate current in 0.75μm N-channel MOSFETs with doubly diffused drain

Author: Watts, R.K., Manchanda, L., and Johnston, R.L.
Abstract: The MOSFET with doubly diffused drain has been proposed as a solution to the problem of degradation in small MOSFETs. We find good agreement between measured gate current and values calculated assuming that the gate current is due to hot channel electrons thermionically emitted into the gate oxide.
Published: 1987

5. A new method to fabricate thin oxynitride/oxide gate dielectric for deep submicron devices

Author: Manchanda, L., Weber, G. R., Kim, Y. O., and Feldman, L. C.
Published: 1993
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