29 results on '"Reichmanis, E."'
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2. Polymer Materials for Microlithography.
3. New photoresists for deep ultraviolet (<300 nm) exposure.
4. Synthesis and lithographic characterization of poly(4-t-butoxycarbonyloxystyrene-sulfone).
5. Characterization of novel sulfonic acid photogenerating 2-nitrobenzyl ester derivatives.
6. An organosilicon novalac resin for multilevel resist applications.
7. Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study.
8. Arylmethyl sulfones: A new class of photoacid generators.
9. A sub-0.5 μm bilevel lithographic process using the deep-UV electron-beam resist p(si-cms).
10. Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography.
11. 193 nm single layer resist strategies, concepts, and recent results.
12. Resist design concepts for 193 nm lithography: Opportunities for innovation and invention.
13. PTBSS: A high resolution single component aqueous base soluble chemically amplified resist.
14. Process characteristics of an all-organic chemically amplified deep-ultraviolet resist.
15. Chemically amplified resists: Chemistry and processes.
16. Deep UV photolithographic systems and processes.
17. Materials for multilevel resist schemes.
18. Experimental tests of the steady-state model for oxygen reactive ion etching of silicon-containing polymers.
19. A stable trans-benzazoninyl anion.
20. The synthesis and characterization of novel 2-nitrobenzyl sulfonate photo-generators of acid.
21. Unsubstituted 9-Azabarbaralane; A π-Destabilized Heterocycle.
22. 3 H-3-Benzazonine and the 3-Benzazoninyl Anion.
23. Cycloadditive coupling between 3,6-diphenyl-s-tetrazine and bicyclo[6.1.0]nona-2,4,6-trienes; pericyclic synthesis of pyridazinocyclononene and pyridazinoazonine frameworks.
24. The 9-azabarbaralane (9-azatricyclo[3,3,1,02,8]nona-3,6-diene) system.
25. 9-(7-Cycloheptatrienyl)-cis,cis,cis,cis-cyclonona-1,3,5,7-tetraene;synthesis and bond-relocation.
26. Reactive Ion Etching and Lithographic Characterization of a New Organosilicon Resist.
27. ChemInform Abstract: Chemical Amplification Mechanisms for Microlithography.
28. ChemInform Abstract: Design, Synthesis, Characterization, and Use of All-Organic Nonionic Photogenerators of Acid.
29. trans-Benzocyclononatetraenyl Anion.
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