1. Nanostructured CuWO4/WO3-x films prepared by reactive magnetron sputtering for hydrogen sensing.
- Author
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Kumar, Nirmal, Čapek, Jiří, and Haviar, Stanislav
- Subjects
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MAGNETRON sputtering , *REACTIVE sputtering , *SPUTTER deposition , *COPPER films , *THIN films , *TUNGSTEN oxides , *TUNGSTATES , *TUNGSTEN trioxide - Abstract
High-purity films consisting of copper tungstate (CuWO 4) and sub-stoichiometric tungsten oxide (WO 3- x) were prepared by reactive sputter deposition. An original two-step deposition process was applied for their synthesis. First, a tungsten oxide thin film was deposited by dc magnetron sputtering from a W target in an Ar + O 2 gas mixture, afterward, rf sputtering of a Cu target in an Ar + O 2 gas mixture was employed to form a discontinuous CuWO 4 layer at the top. This results in a formation of nanostructured branched islands of the tungstate. Bilayers with various layer thicknesses were investigated for the sensitivity to hydrogen gas as a conductometric sensor. The sensitivity changes remarkably with the thicknesses of individual layers. The maximum sensitivity was observed for the films with a layer thickness ratio of 5 nm/20 nm. The response was enhanced more than eight times compared to a 20 nm-thick tungsten oxide alone film. An explanation based on the formation of nano-sized n - n junctions is provided. In addition, a microscopy study of the bilayer growth is presented in detail. Image 1 • Two-step reactive sputter deposition used for CuWO 4 /WO 3- x bilayer films synthesis. • Nanostructured CuWO 4 islands were formed on top of WO 3 thin film. • CuWO 4 /WO 3- x tested for the H 2 gas response for the first time. • Sensing mechanism based on the formation of nano-sized n - n junction is proposed. • Only dry techniques were employed for deposition → high-purity films were prepared. [ABSTRACT FROM AUTHOR]
- Published
- 2020
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