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InGaN/GaN double heterostructures and multiquantum wells (MQWs) have been successfully developed since more than 20 years for LED lightning applications. Recent developments show that state-of-the-art LEDs benefit from artificially generated V-pit defects. However, the control of structural and chemical properties plays a tremendous role. In this paper, we report on the lateral distribution of V-pit defects and photoluminescence of InGaN/GaN MQWs grown on thick GaN on patterned sapphire substrates. The synchrotron-based scanning X-ray diffraction microscopy technique K-map was employed to locally correlate these properties with the local tilt, strain, and composition of the InGaN/GaN MQW. Compositional fluctuation is the main factor for the variation of photoluminescence intensity and broadening. In turn, V-pit defects align along small-angle grain boundaries and their strain fields are identified as a reason for promoting the InGaN segregation process on a microscale.

Avalanche generation is a physical mechanism responsible for the breakdown at extremely high field, such as in the reverse bias conditions typical of ESD discharges. In this work, for the first time we provide experimental evidence that avalanche generation can take place in state-of-the-art InGaN-based blue LEDs. We measured the current-voltage and electroluminescence curves of the devices while pulsing them with increasing reverse voltages. We investigated a wide span of temperatures (from cryogenic to room temperature) in order to verify that the increase in leakage current detected below -80 V is related to avalanche generation (positive temperature-coefficient). Numerical simulations show that in this bias condition the band-to-band tunneling barrier thickness is low, leading to the possible injection of highly-energetic electrons from the p-side to the n-side that can start the avalanche process. The spectral shape shows a broad emission, covering the spectral range between 1.25 and 3.5 eV; the low energy side slowly decreases below 2.2 eV, and two sharp edges are seen at the high-energy side. Since an avalanche generation process is present, we can interpret the spectrum as follows: (i) hole and electron pairs generated by the avalanche process recombine, emitting photons; (ii) high-energy side: reabsorption of the emitted photons in the In-containing layers and nGaN side, confirmed by the red-shift at higher temperature; (iii) low-energy side: internal photoluminescence of the defects in the n-GaN layer, confirmed by PL measurements with external excitation. A theoretical computation based on this model is able to reproduce the experimental data.

International audience; The influence of the growth substrate on the internal quantum efficiency (IQE) of deep ultraviolet (UV) light emitting diodes is studied. Two nominally identical Al-rich AlGaN/AlN multi-quantum-well (MQW) structures grown by metalorganic vapour phase epitaxy (MOVPE) on different substrates were investigated. The first MQW structure was grown on a native AlN substrate, while the second one was deposited on an AlN template on sapphire. By the combination of atomic force microscopy (AFM), photoluminescence (PL) and cathodoluminescence (CL) spectroscopy, we demonstrate that the dislocation-mediated spiral growth of MQWs on sapphire results in the more efficient localization of carriers. This effect helps to prevent non-radiative carrier recombination at point defects, improving the IQE of the structure. I.

We investigate carrier localization in Al-rich AlGaN/AlN quantum well (QW) structures. Low temperature time-resolved photoluminescence (PL) experiments reveal a strong variation of the carrier decay times with detection photon energy, suggesting a strong impact of carrier localization, which is found to depend primarily on the QW width. In combination with time-integrated PL measurements and numerical band structure calculations, we are able to provide conclusive evidence that the localization strength in AlGaN-based QW structures is directly coupled to the oscillator strength, providing an explanation for its strong dependence on the QW width. This is further supported by the observation of a strong polarization field dependency of the carrier localization, which excludes excitons and may be explained by the accumulation of electrons close to the QW interface, while holes are independently localized across the QW. We complete our discussion by proposing a model to explain the well-known phenomenon of efficiency droop in accordance with our findings, suggesting delocalization-induced Auger recombination as the responsible loss channel.

Herein, the optical properties of aluminum nitride (AlN) epitaxial layers grown on sapphire substrates by metal-organic chemical vapor deposition (MOCVD) are reported. The structures investigated in this study are grown at highly different degrees of supersaturation in the MOCVD process. In addition, both pulsed and continuous growth conditions are employed and AlN is deposited on nucleation layers favoring different polarities. The samples are investigated by photoluminescence (PL), photoluminescence excitation (PLE), and absorption spectroscopy and are found to vary significantly in absorption and emission characteristics. Two distinct absorption bands in the UV-C spectral range are observed and examined in greater detail, with either giving rise to a significant absorption coefficient of around 1000 cm−1. The corresponding defect transitions are identified by PL spectroscopy. Combined with secondary-ion mass spectrometry (SIMS) measurements, these absorption bands are allocated to the incorporation of carbon and oxygen impurities, depending on the applied growth conditions. Furthermore, similarities with other epitaxial growth techniques serving as basis for UV-C applications are highlighted. These results are highly relevant for a better understanding of absorption issues in AlN templates grown by various deposition techniques. In addition, consequences for the growth of efficient UV-C devices by MOCVD on sapphire substrates are outlined.

The carrier dynamics of Al-rich AlGaN/AlN quantum well (QW) structures in the presence of strong carrier localization is reported. Excitation density-dependent photoluminescence (PL) measurements at low temperatures reveal a clear correlation between the onset of efficiency droop and the broadening of the time-integrated PL spectra. While the droop onset is heavily impacted by the localization strength, the PL emission broadening is observed almost exclusively on the high energy side of the emission spectrum. Spectrally resolved PL decay transient measurements reveal a strong dependency of the carrier lifetimes on the emission photon energy across the spectrum, consistent with a distribution of localized states, as well as on the temperature, depending on the localization strength of the investigated structure. The characteristic “S”-shaped temperature dependence of the PL emission energy is shown to be directly correlated to the thermal redistribution of carriers between localized states. Based on these findings, the role of carrier localization in the recombination processes in AlGaN QW structures is underlined and its implications for efficiency droop are discussed.

Carrier dynamics in AlGaN-based single quantum well (QW) structures grown on sapphire are studied by means of time-integrated and time-resolved photoluminescence spectroscopy (PL) in a wide temperature range from 5 K to 350 K. The samples cover a broad compositional range, with aluminum contents ranging between 42% and 60% and QW widths between 1.5 nm and 2.5 nm. All samples reveal the characteristic “S”-shape temperature dependence of the PL emission energy as frequently reported in InGaN-based systems, albeit with significantly larger localization strengths of up to 60 meV. It is shown that in the compositional range investigated, carrier localization is determined primarily by the QW width and, in contrast, exhibits a much weaker dependence on aluminum concentration. By the combination of time-integrated and time-resolved PL measurements, the localization of carriers is demonstrated to have a significant impact on the recombination dynamics of AlGaN/AlN QWs grown on sapphire, heavily affecting the internal quantum efficiency and efficiency droop even in standard LED operation conditions.

A monolithic integrable capacitive humidity sensing method to determine water vapour transmission rates (WVTRs) of dielectric thin films is presented. The capacitive sensor, being used to detect transmission of water vapour, as well as the dielectric thin film to be tested can be processed subsequently with standard semiconductor technology. First measurements yield a reliable value of the well investigated dielectric silicon dioxide (SiO 2 ). A 330 nm thick plasma enhanced chemical vapour deposited film of SiO 2 showed a WVTR of ∼ 1.6 ∗ 10 - 2 ± 0.7 ∗ 10 - 2 g m 2 ∗ d at 124 °C and a step in surrounding relative humidity from 65% to 85%. The working principle of the sensor, its drawbacks and improvements are discussed and compared with other methods.

We report on a systematic study of the determination of the internal quantum efficiency (IQE) in AlGaN-based multiple-quantum-well (MQW) structures using different optical evaluation methodologies and experimental conditions, in order to derive a standard set of measurement conditions for reliable IQE determination. Several potential sources of error that may distort the IQE obtained by optical measurements are discussed, such as carrier transport effects, excitation conditions failing to fulfill ideal resonance conditions, and morphology issues. A series of nominally identical AlGaN-based MQW structures is grown on an AlGaN layer separated by an AlN interlayer of varying thickness. The MQW structures are studied both by resonant and quasiresonant photoluminescence spectroscopy, and IQEs are determined via different commonly employed methods. The obtained values are shown to be significantly affected by the employed excitation conditions, as well as the evaluation techniques. In addition, growth morphology issues and carrier transport effects need to be considered in the interpretation of the measured data, with the latter being investigated in greater detail. The results emphasize the need for an appropriate choice of both experimental conditions and evaluation methodology in order to extract reliable and comparable IQE values.

Recent experimental investigations on the reduction of internal quantum efficiency with increasing current density in (AlInGa)N quantum well structures show that Auger recombination is a significant contributor to the so-called "droop" phenomenon. Using photoluminescence (PL) test structures, we find Auger processes are responsible for at least 15 % of the measured efficiency droop. Furthermore, we confirm that electron-electron-hole (nnp) is stronger than electron-hole-hole (npp) Auger recombination in standard LEDs. The ratio of respective Auger coefficients is determined to be in the range 1 < C-nnp = C-npp

The thermal droop (reduction of the optical power when the temperature is increased) is a phenomenon that strongly limits the efficiency of InGaN-based light-emitting diodes. In this paper we analyze the role of Shockley-Read-Hall (SRH) recombination and of the electron blocking layer (EBL) in the process by using numerical simulations and literature data. The benefic impact of EBL suggests that carrier escape from the quantum wells gives a significant contribution to the thermal droop, therefore we review some of the mechanisms described in the literature (thermionic emission, phonon-assisted tunneling, thermionic trap-assisted tunneling). Since no formulation is able to fit the behavior of the measured SQW devices, we develop a new model based on two phonon-assisted tunneling steps through a defective state, extended in order to take into account zero-field emission. By using experimental data, material constants from the literature and only two fitting parameters the model is able to reproduce the experimental behavior.

This paper reports an investigation of the physical origin of the thermal droop (the drop of the optical power at high temperatures) in InGaN-based light-emitting diodes. We critically investigate the role of various mechanisms including Shockley-Read-Hall recombination, thermionic escape from the quantum well, phonon-assisted tunneling, and thermionic trap-assisted tunneling; in addition, to explain the thermal droop, we propose a closed-form model which is able to accurately fit the experimental data by using values extracted from measurements and simulations and a limited set of fitting parameters. The model is based on a two-step phonon-assisted tunneling over an intermediate defective state, corrected in order to take into account the pure thermionic component at zero bias and the field-assisted term.

This paper describes the degradation of InGaN-based LEDs submitted to constant current stress; based on combined electroluminescence, photoluminescence and deep-level transient spectroscopy we show that: (i) when submitted to constant current stress, LEDs can show a measurable decrease in the optical power, which is more prominent in the low current regime; (ii) the decrease in optical power is strongly correlated to the increase in the Shockley–Read–Hall recombination coefficient A, as estimated by differential lifetime measurements; (iii) stress induces the increase in the concentration of a trap level, with activation energy between 0.6 and 0.7 eV, which is supposed to be located next to/within the active region. The results suggest that the optical degradation can be ascribed to the increase in non-radiative recombination, rather than to a decrease in carrier injection efficiency.

Atomic layer deposited aluminum oxide (ALD-Al2O3) is a dielectric material, which is widely used in organic light emitting diodes in order to prevent their organic layers from humidity related degradation. Unfortunately, there are strong hints that in some cases, ALD-Al2O3 itself is suffering from humidity related degradation. Especially, high temperature and high humidity seem to enhance ALD-Al2O3 degradation strongly. For this reason, the degradation behavior of ALD-Al2O3 films at high temperature and high humidity was investigated in detail and a way to prevent it from degradation was searched. The degradation behavior is analyzed in the first part of this paper. Using infrared absorbance measurements and X-ray diffraction, boehmite (γ-AlOOH) was identified as a degradation product. In the second part of the paper, it is shown that ALD-Al2O3 films can be effectively protected from degradation using a silicon oxide capping. The deposition of very small amounts of silicon in a molecular beam epitaxy syst...

The degradation of atomic layer deposited aluminum oxide (ALD-Al2O3) at high temperature and high humidity was investigated. The intrinsic hydroxyl concentration of as-deposited ALD-Al2O3 was evaluated using a temperature dependent deposition study and its impact on degradation behavior was analyzed. In addition, the degradation of ALD-Al2O3 was monitored in situ using a plate capacitor with ALD-Al2O3 as dielectric. A model for the ALD-Al2O3 degradation mechanism was proposed based on the penetration of water molecules into the ALD-Al2O3 and on the formation of aluminum hydroxide. Two parameters, delay-time (time till a change in capacitance occurs) and wetting speed (speed of molecular water penetration into the ALD-Al2O3), were extracted from the capacitance measurements in order to evaluate the dependence of ALD-Al2O3 degradation on temperature and humidity.

This paper presents an extensive investigation of the deep levels related to non-radiative recombination in InGaN/GaN light-emitting diodes (LEDs). The study is based on combined optical and deep-level transient spectroscopy measurements, carried out on LEDs with identical structure and with different values of the non-radiative recombination coefficient. Experimental data lead to the following, relevant, results: (i) LEDs with a high non-radiative recombination coefficient have a higher concentration of a trap (labeled as “e2”) with an activation energy of 0.7 eV, which is supposed to be located close to/within the active region; (ii) measurements carried out with varying filling pulse duration suggest that this deep level behaves as a point-defect/dislocation complex. The Arrhenius plot of this deep level is critically compared with the previous literature reports, to identify its physical origin.

We report the direct observation of hot carriers generated by Auger recombination via photoluminescence spectroscopy on tailored (AlGaIn)N multiple quantum well (QW) structures containing alternating green and ultra-violet (UV) emitting (GaIn)N QWs. Optically pumping solely the green QWs using a blue emitting high power laser diode, carrier densities similar to electrical light-emitting diode (LED) operation were achieved, circumventing possible leakage and injection effects. This way, luminescence from the UV QWs could be observed for excitation where the emission from the green QWs showed significant droop, giving direct evidence for Auger generated hot electrons and holes being injected into the UV QWs. An examination of the quantitative relation between the intensity of the UV luminescence and the amount of charge carriers lost due to drooping of the QWs supports the conclusion that Auger processes contribute significantly to the droop phenomenon in (AlGaIn)N based light-emitting diodes.

Recent photoluminescence experiments presented by M. Binder et al. [Appl. Phys. Lett. 103, 071108 (2013)] demonstrated the visualization of high-energy carriers generated by Auger recombination in (AlInGa)N multi quantum wells. Two fundamental limitations were deduced which reduce the detection efficiency of Auger processes contributing to the reduction in internal quantum efficiency: the transfer probability of these hot electrons and holes in a detection well and the asymmetry in type of Auger recombination. We investigate the transport and capture properties of these high-energy carriers regarding polarization fields, the transfer distance to the generating well, and the number of detection wells. All three factors are shown to have a noticeable impact on the detection of these hot particles. Furthermore, the investigations support the finding that electron-electron-hole exceeds electron-hole-hole Auger recombination if the densities of both carrier types are similar. Overall, the results add to the evidence that Auger processes play an important role in the reduction of efficiency in (AlInGa)N based LEDs.

We have studied the electrical and optical characteristics of (AlGaIn)N multiple quantum well light-emitting diodes. Minimizing contact effects by utilizing platinum as p-contact metal, ideality factors as low as 1.1 have been achieved. In agreement with basic semiconductor theory, a correlation between ideality factor and small-current efficiency was found. We were able to emulate the experimental current-voltage characteristic over seven orders of magnitude utilizing a two diode model. This model enables a very good prediction of internal quantum efficiency at moderate current densities out of purely electrically derived parameters.

In this paper, the carrier transport in (Al)InGaN based test structures with In-rich quantum wells on c-plane substrates is investigated under high current operation. To get access to the injection efficiency, the devices are processed as ridge waveguide lasers and examined above threshold. The slope efficiency reveals a slight decrease as a function of current even under pulsed operation that can be related to a reduction of the injection efficiency based on carrier leakage. As the test structure contains an InGaN detection layer on the n-side, it is possible to verify hole overflow across the active region. Moreover, by analysing the current dependence of the radiative recombination in the detection layer, the reduction of slope efficiency can be correlated to increasing hole leakage.