Optimization of the Refractive Index of Antireflection Coatings on Monocrystalline Silicon Solar Cells for Photovoltaic Application

In this work, the following materials have been chosen as anti-reflection layer, namely hafnium (HfO2), magnesium fluoride (MgF2), silicon oxynitrides (SiOxNy), silicon oxides (SiOx), silicon nitride (Si3N4) and hydrogenated silicon nitride (SiNx:H). The calculations were made on the basis of values of layer thicknesses and refractive indices that allow the phase and amplitude conditions to be respected and amplitude conditions. Numerical simulations have shown that low reflectivities at the surface of the surface of the plane cell coated with a simple layer, can be obtained. For example, for simple coatings materials based on Si3N4 and HfO2, we obtain a value of reflectivity around 3 and 2 % respectively. The structures with multilayer coatings such as MgF2/SiNx:H/Si, give a reflectivity of around 1 %. Thus, the refraction index of the coating is an important parameter that plays a major parameter that plays a major role in the optical properties of materials. The closer the refractive index is close to the index of the substrate or the layer above the substrate, the higher the reflectivity.