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Determining antiferromagnetic domain patterns electrically

Authors :
Kosub, T.
Hübner, R.
Appel, P.
Shields, B.
Maletinsky, P.
Kopte, M.
Schmidt, O. G.
Faßbender, J.
Makarov, D.
Kosub, T.
Hübner, R.
Appel, P.
Shields, B.
Maletinsky, P.
Kopte, M.
Schmidt, O. G.
Faßbender, J.
Makarov, D.
Source :
AF Spintronics Workshop, 25.10.2017, Grenoble, France
Publication Year :
2017

Abstract

Extrinsic effects on Cr2O3 thin films are shown. Also a statistical method to evaluate AF domain pattern in an electric way is demonstrated.

Details

Database :
OAIster
Journal :
AF Spintronics Workshop, 25.10.2017, Grenoble, France
Notes :
English
Publication Type :
Electronic Resource
Accession number :
edsoai.on1415613594
Document Type :
Electronic Resource

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