Self-supported amorphous TaNx(O-y)/nickel foam thin film as an advanced electrocatalyst for hydrogen evolution reaction

Chemical vapor deposited (CVD) amorphous tantalum-oxy nitride film on porous three-dimensional (3D) nickel foam (TaNx(O-y)/NF) utilizing tantalum precursor, tris(diethylamino)(ethylimino)tantalum(V), ([Ta(NEt)(NEt2)(3)]) with preformed Ta-N bonds is reported as a potential self-supported electrocatalyst for hydrogen evolution reaction (HER). The morphological analyses revealed the formation of thin film of core-shell structured TaNx(O-y) coating (ca. 236 nm) on NF. In 0.5 M H2SO4, TaNx(O-y)/NF exhibited enhanced HER activity with a low onset potential as compared to the bare NF (-50 mV vs. -166 mV). The TaNx(O-y)/NF samples also displayed higher current density (-11.08 mA cm(-2)vs. -3.36 mA cm(-2) at 400 mV), lower Tafel slope (151 mV dec(-1)vs. 179 mV dec(-1)) and lower charge transfer resistance exemplifying the advantage of TaNx(O-y) coating towards enhanced HER performance. The enhanced HER catalytic activity is attributed to the synergistic effect between the amorphous TaNx(O-y) film and the nickel foam.