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Evolution of arsenic in high fluence plasma immersion ion implanted silicon: Behavior of the as-implanted surface
- Authors :
- Sub Inorganic Chemistry and Catalysis
Inorganic Chemistry and Catalysis
Vishwanath, V.
Demenev, E.
Giubertoni, D.
Vanzetti, L.
Koh, A. L.
Steinhauser, G.
Pepponi, G.
Bersani, M.
Meirer, F.
Foad, M. A.
Sub Inorganic Chemistry and Catalysis
Inorganic Chemistry and Catalysis
Vishwanath, V.
Demenev, E.
Giubertoni, D.
Vanzetti, L.
Koh, A. L.
Steinhauser, G.
Pepponi, G.
Bersani, M.
Meirer, F.
Foad, M. A.
- Publication Year :
- 2015
Details
- Database :
- OAIster
- Notes :
- English
- Publication Type :
- Electronic Resource
- Accession number :
- edsoai.on1379144949
- Document Type :
- Electronic Resource