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Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials
- Publication Year :
- 2021
-
Abstract
- Irradiation effects of PMMA induced by femtosecond-pulsed extreme ultraviolet (EUV) were investigated using Soft X-ray free electron laser (SXFEL) for realization of next generation lithography. The sensitivity of PMMA upon exposure to femtosecond-pulsed SXFEL was much higher than that measured for conventional nanosecond-pulsed EUV source. This result speculates the reactions induced by femtosecond-pulsed SXFEL was different from those induced by nanosecond-pulsed EUV.
Details
- Database :
- OAIster
- Notes :
- English
- Publication Type :
- Electronic Resource
- Accession number :
- edsoai.on1375190089
- Document Type :
- Electronic Resource