Application of ECR ion sources for surface modification of materials

Electron cyclotron resonance ion sources (ECRIS) have been used primarily as injectors for cyclotrons and linear accelerators. Significant improvement of their performance iii the last two decades and substantial reduction of their price and running cost have opened the new fields of their application. In this paper we describe the applications of ECRIS in the field of surface modification of materials, which represent a relatively novel approach. The major advantages of these sources when compared to other sources applied in this field are: production of multiply charged ions, wide range of ion species obtained from gaseous and solid substances, and uninterrupted stable operation in a long period of time. New types of low power consumption ECR ion sources, with the magnetic structure made entirely of permanent magnets, are well suited for the applications using high voltage platforms, e.g., for ion implantation.