Cite
Nanocrystalline silicon films grown by low energy plasma enhanced chemical vapor deposition for optoelectronic applications
MLA
Binetti, S., et al. Nanocrystalline Silicon Films Grown by Low Energy Plasma Enhanced Chemical Vapor Deposition for Optoelectronic Applications. 2005. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsoai&AN=edsoai.on1308888634&authtype=sso&custid=ns315887.
APA
Binetti, S., Acciarri, M., Bollani, M., Fumagalli, L., von Kanel, H., Pizzini, S., Binetti, S. O., Acciarri, M. F., & Pizzini, S. (2005). Nanocrystalline silicon films grown by low energy plasma enhanced chemical vapor deposition for optoelectronic applications.
Chicago
Binetti, S, M Acciarri, M Bollani, L Fumagalli, H von Kanel, S Pizzini, Simona Olga Binetti, Maurizio Filippo Acciarri, and Sergio Pizzini. 2005. “Nanocrystalline Silicon Films Grown by Low Energy Plasma Enhanced Chemical Vapor Deposition for Optoelectronic Applications.” http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsoai&AN=edsoai.on1308888634&authtype=sso&custid=ns315887.