A reactive transport modeling perspective on the dynamics of interface-coupled dissolution-precipitation

In interface coupled dissolution-precipitation systems, the dynamics of the mineral-fluid interface depends on two intertwining processes: the dissolution of the primary mineral that is needed for subsequent precipitation and the passivation of the dissolution reaction as a result of secondary mineral precipitation. The resulting thickness and texture of the precipitating coating layer will affect the progression of geochemical reactions, flow and transport processes at the macroscopic scale. Understanding the interplay between macroscopic flow regimes and microscopic reaction mechanisms (e.g., nucleation and crystal growth pathways) in controlling the dynamics of the mineral-fluid interface has important implications for predicting natural weathering processes, scaling in the subsurface energy production systems, etc. In this study, we use a micro-continuum pore-scale reactive transport model to investigate the feedback loop between reaction rate and solute transport with explicit consideration of the surface passivation and the diffusion process through the coating layer, as well as the impacts of saturation-dependent nucleation rate on the textures of precipitates that will largely dictate the diffusion properties of the coating layer. Our model results highlight that the drastically different coating behaviors at the macroscopic scale and their dependence on solution supersaturation observed in previous column experiments are primarily controlled by the interplay between mineral reaction rates, advective flow, and diffusion through the dynamically forming coating layer. The diffusion properties of the coating layer also play a secondary but non-negligible role in shaping the evolution of the co-dissolution and precipitation system. The probabilistic nucleation model building on the framework of classical nucleation theory highlights the complex dependence of precipitates’ texture on solution chemistry and substrate properties, which can affect the diffusion proc