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Material aspects for batch integration of PZT thin films using transfer bonding technologies : Q2M development

Authors :
Bhattacharyya, Debabrata
Wright, Rob V.
Zhang, Q.
Kirby, Paul B.
Guerre, Roland
Drechsler, U.
Despont, Michel
Saharil, Farizah
Oberhammer, Joachim
Bhattacharyya, Debabrata
Wright, Rob V.
Zhang, Q.
Kirby, Paul B.
Guerre, Roland
Drechsler, U.
Despont, Michel
Saharil, Farizah
Oberhammer, Joachim
Publication Year :
2008

Abstract

Transfer bonding is a reliable cost-efficient and low-temperature CMOS compatible technique which allows batchintegration of materials whose incompatibility with Si makes them unsuitable for monolithic integration. In thisheterogeneous device integration method the material and process incompatibilities inherent in Si IC technology areovercome by fabricating devices on separate substrates and then transferring them onto target (e.g. CMOS) wafers.Transfer bonding has great potential for integrating RF-MEMS devices incorporating, for example, high thermal budgetmaterials such as PZT and PST or non-ferroelectric piezoelectrics such as AlN and ZnO into microwave ICs forenhanced systems performance. This paper presents an overview of technology developments within the EUsponsored project Q2M for the realization of transfer bonded piezoelectrically actuated RF MEMS switches and othercomponents focusing in particular on material factors relating to growth of the piezoelectric films, in this case sol-geldeposited PZT, that restricts the choice of device layers and impact on PZT properties such as microstructure, filmorientation and piezoelectric coefficients. New process developments such as hard masking of PZT pattern during RIEetching and its compatibility with polymer transfer bonding are discussed.<br />QC 20120514

Details

Database :
OAIster
Notes :
English
Publication Type :
Electronic Resource
Accession number :
edsoai.on1234664806
Document Type :
Electronic Resource