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The role of Ohmic heating in dc magnetron sputtering

Authors :
Brenning, Nils
Gudmundsson, J. T.
Lundin, D.
Minea, T.
Raadu, M. A.
Helmersson, Ulf
Brenning, Nils
Gudmundsson, J. T.
Lundin, D.
Minea, T.
Raadu, M. A.
Helmersson, Ulf
Publication Year :
2016

Abstract

Sustaining a plasma in a magnetron discharge requires energization of the plasma electrons. In this work, Ohmic heating of electrons outside the cathode sheath is demonstrated to be typically of the same order as sheath energization, and a simple physical explanation is given. We propose a generalized Thornton equation that includes both sheath energization and Ohmic heating of electrons. The secondary electron emission yield gamma(SE) is identified as the key parameter determining the relative importance of the two processes. For a conventional 5 cm diameter planar dc magnetron, Ohmic heating is found to be more important than sheath energization for secondary electron emission yields below around 0.1.<br />Funding Agencies|Swedish Research Council (VR) [621-2014-4882]; Icelandic Research Fund [130029]; Swedish Government Agency for Innovation Systems (VINNOVA) [2014-04876]

Details

Database :
OAIster
Notes :
application/pdf, English
Publication Type :
Electronic Resource
Accession number :
edsoai.on1233552411
Document Type :
Electronic Resource
Full Text :
https://doi.org/10.1088.0963-0252.25.6.065024