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Electron-beam Writing System for Holographic Optical Elements
- Source :
- DTIC AND NTIS
- Publication Year :
- 1992
-
Abstract
- A highly accurate and versatile electron-beam(EB) writing system suitable for fabrication of holographic optical elements (HOEs) with arbitrary patterns is developed. New HOEs with multiple functions are successfully fabricated by the EB system, and their unique applications are introduced.<br />This article is from 'Advanced Processing and Characterization Technologies. Fabrication and Characterization of Semiconductor Optoelectronic Devices and Integrated Circuits Held in Clearwater, Florida on 8-10 May 1991. American Vacuum Society Series 10,' AD-A254 162, p108-111.
Details
- Database :
- OAIster
- Journal :
- DTIC AND NTIS
- Notes :
- text/html, English
- Publication Type :
- Electronic Resource
- Accession number :
- edsoai.ocn831629436
- Document Type :
- Electronic Resource