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Sputtered Thin Film Research

Authors :
UNITED AIRCRAFT RESEARCH LABS EAST HARTFORD CT
Shuskus, Alexander J
Quinn, D J
Paradis, E L
Berak, J M
Cullen, D E
UNITED AIRCRAFT RESEARCH LABS EAST HARTFORD CT
Shuskus, Alexander J
Quinn, D J
Paradis, E L
Berak, J M
Cullen, D E
Source :
DTIC AND NTIS
Publication Year :
1974

Abstract

Amorphous films of neodymium ultraphosphate and neodymium lanthanum ultrophosphate have been deposited by r.f. sputtering. Optical waveguide structures were fabricated and scattering losses were measured to be less than one dB/cm. Fluorescence lifetime measurements of Nd sup (3 tau) are presented. Data on growth of single crystal films of gallium nitride and tungsten trioxide by reactive sputtering is given. Reduced scattering losses in optical waveguide structures of zinc oxide grown on sapphire have been effected by reduction of secondary electron bombardment of the substrate during film growth. Data is presented on the effect of magnetic field configuration on suppressing secondary electron bombardment and its effect on film uniformity.<br />Sponsored in part by DARPA. See also report dated Oct 1973, AD0769972.

Details

Database :
OAIster
Journal :
DTIC AND NTIS
Notes :
text/html, English
Publication Type :
Electronic Resource
Accession number :
edsoai.ocn831533808
Document Type :
Electronic Resource