Measurements of Ion Energy and Ion Flux Distributions in Inductively Coupled Plasmas in CF4/O2/Ar Mixtures

We report mass spectrometric studies of energy distributions and absolute concentrations of ions generated in CF4/O2/Ar inductively coupled rf plasmas. The ions were collected through a 100 mm orifice in the grounded and water cooled lower electrode in a GEC cell configuration. The measurements were made at gas pressures in the 10-50 mTorr range and rf coil power in the 100-300 W range. The observed ions are CF3(+), CF2(+), CF(+), C(+), F(+), COF(+), CO(+), O2(+), and O(+). The relative abundance of these ions varies with pressure and rf power. The energy distribution and absolute concentrations are correlated with electron number density and floating plasma potential measured by a compensated Langmuir probe.