A Comparison of Atomic Oxygen Degradation in Low Earth Orbit and in a Plasma Etcher

In low Earth orbit (LEO) significant degradation of certain materials occurs from exposure to atomic oxygen (AO). Orbital opportunities to study this degradation for specific materials are limited and expensive. While plasma etchers are commonly used in ground-based studies because of their low cost and convenience, the environment produced in an etcher chamber differs greatly from the LEO environment. Because of the differences in environment, the validity of using etcher data has remained an open question. In this paper, degradation data for 22 materials from the orbital experiment Evaluation of Oxygen Interaction with Materials (EOIM-3) are compared with data from EOIM-3 control specimens exposed in a typical plasma etcher. This comparison indicates that, when carefully considered, plasma etcher results can produce order-of-magnitude estimates of orbital degradation. This allows the etcher to be used to screen unacceptable materials from further, more expensive tests.