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Characteristics of III-V Semiconductor Devices at High Temperature

Authors :
Simons, Rainee N
Young, Paul G
Taub, Susan R
Alterovitz, Samuel A
Publication Year :
1994
Publisher :
United States: NASA Center for Aerospace Information (CASI), 1994.

Abstract

This paper presents the development of III-V based pseudomorphic high electron mobility transistors (PHEMT's) designed to operate over the temperature range 77 to 473 K (-196 to 200 C). These devices have a pseudomorphic undoped InGaAs channel that is sandwiched between an AlGaAs spacer and a buffer layer; gate widths of 200, 400, 1600, and 3200 micrometers; and a gate length of 2 micrometers. Measurements were performed at both room temperature and 473 K (200 C) and show that the drain current decreases by 30 percent and the gate current increases to about 9 microns A (at a reverse bias of -1.5 V) at the higher temperature. These devices have a maximum DC power dissipation of about 4.5 W and a breakdown voltage of about 16 V.

Details

Language :
English
Database :
NASA Technical Reports
Notes :
RTOP 506-44-2C, , NAS3-25266
Publication Type :
Report
Accession number :
edsnas.19940028546
Document Type :
Report