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Ballistic-electron-emission microscopy investigation of Schottky barrier interface formation

Authors :
Hecht, M. H
Bell, L. D
Kaiser, W. J
Grunthaner, F. J
Source :
Applied Physics Letters. 55
Publication Year :
1989
Publisher :
United States: NASA Center for Aerospace Information (CASI), 1989.

Abstract

Ballistic-electron-emission microscopy (BEEM) has been used to investigate the origin of defects at the Au/GaAs(100) Schottky barrier interface. In addition, molecular beam epitaxy (MBE) and in situ fabrication methods have been employed to control Schottky barrier interface properties. BEEM characterization combined with MBE methods has enabled the development of a near-ideal Schottky barrier interface with drastically reduced defect density.

Subjects

Subjects :
Solid-State Physics

Details

Language :
English
ISSN :
00036951
Volume :
55
Database :
NASA Technical Reports
Journal :
Applied Physics Letters
Publication Type :
Report
Accession number :
edsnas.19890063824
Document Type :
Report
Full Text :
https://doi.org/10.1063/1.101778