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SiO2/Si interface states at 77 deg K
- Publication Year :
- 1967
- Publisher :
- United States: NASA Center for Aerospace Information (CASI), 1967.
-
Abstract
- Silicon oxide-silicon interface states at 77 degrees K
- Subjects :
- Physics, Solid-State
Subjects
Details
- Language :
- English
- Database :
- NASA Technical Reports
- Notes :
- NGR-36-003-067
- Publication Type :
- Report
- Accession number :
- edsnas.19670030532
- Document Type :
- Report