Measurement of static and vibration induced phase noise in UHF thin-film resonator (TFR) filters

Authors :: Birdsall, steven A.
Dever, Patrick B.
Donovan, Joseph B.
Driscoll, Michael M.
Lakin, Kenneth M.
Pham, Trang H.
Source :: IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. May, 2002, Vol. 49 Issue 5, p643, 6 p.
Publication Year :: 2002
Abstract: Measurements of the static phase noise and vibration sensitivity of thin film resonator (TFR) , operating at 640 MHz and 2110 MHz, are examined. It is shown that the short-term frequency instability of the filters is small, compared with that induced in the oscillator signal by phase modulation (PM) noise.

Subjects :: Thin film devices -- Research
Resonators -- Research
Filtering (Electronics) -- Research
Electronic components industry -- Research
Semiconductor industry -- Research
Frequency stability -- Research
Semiconductor device
Business
Electronics
Electronics and electrical industries

ISSN :: 08853010
Volume :: 49
Issue :: 5
Database :: Gale General OneFile
Journal :: IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control
Publication Type :: Academic Journal
Accession number :: edsgcl.88686129

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