An initio and kinetic calculation for the abstraction reaction of atomic O((sup)3P) with SiH(sub)4

Subjects

Subjects :

Chemical vapor deposition -- Research
Silane -- Usage
Chemical reaction, Rate of -- Analysis
Energy transfer -- Models
Chemicals, plastics and rubber industries

Details

ISSN :

10895639

Volume :

106

Issue :

1

Database :

Gale General OneFile

Journal :

Journal of Physical Chemistry A

Publication Type :

Academic Journal

Accession number :

edsgcl.83252954