Surface morphology and structural changes in insulators induced by high-current 60 keV Cu- implantation

Authors :: Lee, C.G.
Takeda, Y.
Kishimoto, N.
Umeda, N.
Source :: Journal of Applied Physics. Sept 1, 2001, Vol. 90 Issue 5, p2195, 5 p.
Publication Year :: 2001
Abstract: Research describing the surface morphology and phase stability of silicon dioxide and spinel as substrate materials is presented. In particular structural changes and dose rate dependence are investigated.

Subjects :: Ion implantation -- Research
Physics -- Research
Spinel -- Research
Physics

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